Integrated electrochemical analysis of polyvinylpyrrolidone(PVP) as the inhibitor for copper chemical mechanical planarization(Cu-CMP）
文献类型：期刊论文
| 作者 | GuangYang; HaixuWang; NingWang; RongSuna; Ching-PingWong |
| 刊名 | Journal of Alloys and Compounds
 |
| 出版日期 | 2019 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Copper chemical mechanical planarization (Cu-CMP) is an essential procedure for the fabrication of integrated circuits (IC). The corrosion inhibitors in the Cu-CMP slurry could balance the over etching from the corrosion reagents to facilitate the global planarization of the copper layers. However, the normally used Cu-CMP inhibitor 1-benzotriazole (BTA) was toxic for the long time usage. In this paper, the biocompatible polyvinyl pyrrolidone (PVP) was proposed to substitute the BTA in the Cu-CMP. With an integrated electrochemical test, including the Tafel polarization, electrochemical impedance spectra (EIS), and the electrochemical noise (EN), it was found that the PVP could possess a good inhibition effect comparable to BTA, whichopenedupapromisingwayforthedesignofbiocompatibleinhibitorsintheCu-CMP |
| URL标识 | 查看原文 |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/13643]  |
| 专题 | 深圳先进技术研究院_集成所 |
| 推荐引用方式 GB/T 7714 | GuangYang,HaixuWang,NingWang,等. Integrated electrochemical analysis of polyvinylpyrrolidone(PVP) as the inhibitor for copper chemical mechanical planarization(Cu-CMP）[J]. Journal of Alloys and Compounds,2019. |
| APA | GuangYang,HaixuWang,NingWang,RongSuna,&Ching-PingWong.(2019).Integrated electrochemical analysis of polyvinylpyrrolidone(PVP) as the inhibitor for copper chemical mechanical planarization(Cu-CMP）.Journal of Alloys and Compounds. |
| MLA | GuangYang,et al."Integrated electrochemical analysis of polyvinylpyrrolidone(PVP) as the inhibitor for copper chemical mechanical planarization(Cu-CMP）".Journal of Alloys and Compounds (2019). |
入库方式： OAI收割
来源：深圳先进技术研究院
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