Enhancement of perpendicular magnetic anisotropy and coercivity in ultrathin ru/co/ru films through the buffer layer engineering
文献类型：期刊论文
| 作者 | Kolesnikov,Alexander G1; Stebliy,Maxim E1; Ognev,Alexey V1; Samardak,Alexander S1; Fedorets,Aleksandr N2; Plotnikov,Vladimir S2; Han,Xiufeng3; Chebotkevich,Ludmila A1 |
| 刊名 | Journal of physics d: applied physics
 |
| 出版日期 | 2016-09-26 |
| 卷号 | 49期号:42 |
| 关键词 | Multilayer Thin film Interface roughness Perpendicular magnetic anisotropy Elastic strain Magnetic domain Coercive force |
| ISSN号 | 0022-3727 |
| DOI | 10.1088/0022-3727/49/42/425302 |
| 英文摘要 | Abstract we present results on a study of the interplay between microstructure and the magnetic properties of ultrathin ru/co/ru films with perpendicular magnetic anisotropy (pma). to induce pma in the co layer, we experimentally determined thicknesses of the buffer and capping layers of ru. the maximum value of pma was observed for the co thickness of 0.9?nm with the 3?nm thick capping layer. the effective anisotropy field (heff) and coercive force (hc) of the co layer are very sensitive to the ru buffer layer thickness (tb). the values of heff and hc increase approximately by two and ten times, correspondingly, when tb changes from 6 to 20?nm, owing to an increase in volume fraction of the crystalline phase as a result of the grains’ growth. pma is found to be mainly enhanced by elastic strains induced by the lattice mismatch on the ru/co and co/ru interfaces, leading to the deformation of the co lattice. the surface impact is determined to be less than 10% of the magneto-elastic contribution to the effective anisotropy. observation of the magnetic domain structure by means of polar kerr microscopy reveals that out-of-plane magnetization reversal occurs through the nucleation, growth, and annihilation of domains, where the average size drastically rises with the increasing tb. |
| 语种 | 英语 |
| WOS记录号 | IOP:0022-3727-49-42-425302 |
| 出版者 | IOP Publishing |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2373523 |
| 专题 | 物理研究所 |
| 作者单位 | 1.Laboratory of Thin Film Technologies, School of Natural Sciences, Far Eastern Federal University, Vladivostok 690950, Russia 2.Laboratory of Electron Microscopy and Image Processing, School of Natural Sciences, Far Eastern Federal University, Vladivostok 690950, Russia 3.State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing, People’s Republic of China |
| 推荐引用方式 GB/T 7714 | Kolesnikov,Alexander G,Stebliy,Maxim E,Ognev,Alexey V,et al. Enhancement of perpendicular magnetic anisotropy and coercivity in ultrathin ru/co/ru films through the buffer layer engineering[J]. Journal of physics d: applied physics,2016,49(42). |
| APA | Kolesnikov,Alexander G.,Stebliy,Maxim E.,Ognev,Alexey V.,Samardak,Alexander S.,Fedorets,Aleksandr N.,...&Chebotkevich,Ludmila A.(2016).Enhancement of perpendicular magnetic anisotropy and coercivity in ultrathin ru/co/ru films through the buffer layer engineering.Journal of physics d: applied physics,49(42). |
| MLA | Kolesnikov,Alexander G,et al."Enhancement of perpendicular magnetic anisotropy and coercivity in ultrathin ru/co/ru films through the buffer layer engineering".Journal of physics d: applied physics 49.42(2016). |
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