Comparative characterization of high-density plasma reactors using emission spectroscopy from vuv to nir
文献类型:期刊论文
作者 | Pu, YK; Guo, ZG; Kang, ZD; Ma, J; Guan, ZC; Zhang, GY; Wang, EG |
刊名 | Pure and applied chemistry
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出版日期 | 2002-03-01 |
卷号 | 74期号:3页码:459-464 |
ISSN号 | 0033-4545 |
通讯作者 | Pu, yk() |
英文摘要 | Emission spectroscopy is used to investigate the effect of inert gas mixing in nitrogen plasmas generated in inductively coupled plasma (icp) and electron cyclotron resonance (ecr) plasma sources. vacuum ultraviolet (vuv) emission of resonance lines is used to determine concentration of atomic nitrogen while electron temperature is obtained from optical emission spectra. it is found that electron temperature can be either raised or reduced effectively by mixing helium or argon in a nitrogen discharge. electron-electron collisions and superelastic collisions involving metastable species are key factors in electron temperature tuning. |
WOS关键词 | ELECTRON-ENERGY DISTRIBUTIONS ; VACUUM-ULTRAVIOLET ; DISCHARGE ; COLLISIONS ; MIXTURES |
WOS研究方向 | Chemistry |
WOS类目 | Chemistry, Multidisciplinary |
语种 | 英语 |
WOS记录号 | WOS:000175247500020 |
出版者 | INT UNION PURE APPLIED CHEMISTRY |
URI标识 | http://www.irgrid.ac.cn/handle/1471x/2373940 |
专题 | 物理研究所 |
通讯作者 | Pu, YK |
作者单位 | 1.Tsing Hua Univ, Dept Elect Engn, Beijing 100084, Peoples R China 2.Acad Sinica, Inst Phys, Beijing 100080, Peoples R China |
推荐引用方式 GB/T 7714 | Pu, YK,Guo, ZG,Kang, ZD,et al. Comparative characterization of high-density plasma reactors using emission spectroscopy from vuv to nir[J]. Pure and applied chemistry,2002,74(3):459-464. |
APA | Pu, YK.,Guo, ZG.,Kang, ZD.,Ma, J.,Guan, ZC.,...&Wang, EG.(2002).Comparative characterization of high-density plasma reactors using emission spectroscopy from vuv to nir.Pure and applied chemistry,74(3),459-464. |
MLA | Pu, YK,et al."Comparative characterization of high-density plasma reactors using emission spectroscopy from vuv to nir".Pure and applied chemistry 74.3(2002):459-464. |
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来源:物理研究所
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