中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of doping in inp buffer on photoluminescence behavior of inpbi

文献类型:期刊论文

作者Wang, Peng1,2; Pan, Wenwu1,2; Cao, Chunfang1; Wu, Xiaoyan1,2; Wang, Shumin1; Gong, Qian1
刊名Japanese journal of applied physics
出版日期2016-11-01
卷号55期号:11页码:4
ISSN号0021-4922
DOI10.7567/jjap.55.115503
通讯作者Gong, qian(qgong@mail.sim.ac.cn)
英文摘要Inp1-xbix epilayers with 1.0% bismuth concentration were grown on inp(001) substrates by gas-source molecular beam epitaxy. silicon and beryllium were doped into the inp buffer layer, and their influences on the photoluminescence (pl) emission of inpbi were investigated. the pl emission of inpbi was found to be intensified by beryllium doping into the inp buffer layer. however, there was no influence of silicon doping. to investigate the reason for the pl intensity enhancement of inpbi, the carrier transport behavior at the interface was also discussed. (c) 2016 the japan society of applied physics
WOS关键词MOLECULAR-BEAM EPITAXY ; TEMPERATURE ; BISMUTH
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000386430300001
出版者IOP PUBLISHING LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2374958
专题中国科学院大学
通讯作者Gong, Qian
作者单位1.Chinese Acad Sci, Shanghai Inst Microsyst& Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Sch Phys, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Wang, Peng,Pan, Wenwu,Cao, Chunfang,et al. Influence of doping in inp buffer on photoluminescence behavior of inpbi[J]. Japanese journal of applied physics,2016,55(11):4.
APA Wang, Peng,Pan, Wenwu,Cao, Chunfang,Wu, Xiaoyan,Wang, Shumin,&Gong, Qian.(2016).Influence of doping in inp buffer on photoluminescence behavior of inpbi.Japanese journal of applied physics,55(11),4.
MLA Wang, Peng,et al."Influence of doping in inp buffer on photoluminescence behavior of inpbi".Japanese journal of applied physics 55.11(2016):4.

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来源:中国科学院大学

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