Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface
文献类型：期刊论文
| 作者 | Zhang, Zhen; Jiang, Zhiquan; Yao, Yunxi; Tan, Dali; Fu, Qiang; Bao, Xinhe |
| 刊名 | thin solid films
 |
| 出版日期 | 2008-04-30 |
| 卷号 | 516期号:12页码:3741-3746 |
| 关键词 | silica films metal-oxide interfaces X-ray photoelectron spectroscopy ultraviolet photoelectron spectroscopy high-resolution electron energy loss spectroscopy scanning tunneling microscopy |
| 产权排序 | 1;1 |
| 通讯作者 | 包信和 |
| 英文摘要 | ultrathin silica films with different thicknesses have been gown on a pd(100) surface by depositing silicon in the presence of o-2. the film composition and electronic properties were characterized by x-ray photoelectron spectroscopy (xps), ultraviolet photoelectron spectroscopy (ups), and high-resolution electron energy loss spectroscopy (hreels). scanning tunneling microscopy was applied to investigate the film morphology and lattice structure. the results show that the obtained films are atomically flat and highly ordered in a long range. ups and hreels measurements indicate that the silica film has the same electronic and vibrational properties as bulk silica. a 2.8 nm thick film exhibits low defects in the film and high thermal stability up to 800 k, as evidenced by ion scattering spectroscopy and xps. (c) 2007 elsevier b.v. all rights reserved. |
| WOS标题词 | science & technology ; technology ; physical sciences |
| 类目[WOS] | materials science, multidisciplinary ; materials science, coatings & films ; physics, applied ; physics, condensed matter |
| 研究领域[WOS] | materials science ; physics |
| 关键词[WOS] | sio2 thin-films ; dioxide films ; initial-stages ; growth ; xps ; spectroscopy ; crystalline ; mo(112) ; photoemission ; interface |
| 收录类别 | SCI |
| 原文出处 | true |
| 语种 | 英语 |
| WOS记录号 | WOS:000255125900004 |
| 公开日期 | 2010-11-30 |
| 源URL | [http://159.226.238.44/handle/321008/100579]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Zhen,Jiang, Zhiquan,Yao, Yunxi,et al. Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface[J]. thin solid films,2008,516(12):3741-3746. |
| APA | Zhang, Zhen,Jiang, Zhiquan,Yao, Yunxi,Tan, Dali,Fu, Qiang,&Bao, Xinhe.(2008).Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface.thin solid films,516(12),3741-3746. |
| MLA | Zhang, Zhen,et al."Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface".thin solid films 516.12(2008):3741-3746. |
入库方式： OAI收割
来源：大连化学物理研究所
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