中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Direct growth of sb2te3 on graphene by atomic layer deposition

文献类型:期刊论文

作者Zheng, Li1,2; Cheng, Xinhong1; Cao, Duo1,2; Wang, Qian1,2; Wang, Zhongjian1; Xia, Chao1,2; Shen, Lingyan1,2; Yu, Yuehui1; Shen, Dashen3
刊名Rsc advances
出版日期2015
卷号5期号:50页码:40007-40011
ISSN号2046-2069
DOI10.1039/c5ra04698j
通讯作者Cheng, xinhong(xh_cheng@mail.sim.ac.cn)
英文摘要The direct growth of sb2te3 on graphene is achieved by atomic layer deposition (ald) with pre-(me3si)(2)te treatment. the results of atomic force microscopy (afm) indicate volmer-weber island growth is the dominant growth mode for ald sb2te3 growth on graphene. high resolution transmission electron microscopy (hrtem) analysis reveals perfect crystal structures of sb2te3 on graphene and no interface layer generation. the characterization of x-ray photoelectron spectroscopy (xps) implies the impermeability of graphene can maintain sb2te3 intact and isolate the adverse effects of substrates. our study provides a step forward to grow high quality sb2te3 at low temperature and expand the potential applications of graphene in ald techniques.
WOS关键词TOPOLOGICAL INSULATORS ; THIN-FILMS ; BI2TE3
WOS研究方向Chemistry
WOS类目Chemistry, Multidisciplinary
语种英语
WOS记录号WOS:000354211100046
出版者ROYAL SOC CHEMISTRY
URI标识http://www.irgrid.ac.cn/handle/1471x/2376511
专题中国科学院大学
通讯作者Cheng, Xinhong
作者单位1.Chinese Acad Sci, Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Univ Alabama, Huntsville, AL 35899 USA
推荐引用方式
GB/T 7714
Zheng, Li,Cheng, Xinhong,Cao, Duo,et al. Direct growth of sb2te3 on graphene by atomic layer deposition[J]. Rsc advances,2015,5(50):40007-40011.
APA Zheng, Li.,Cheng, Xinhong.,Cao, Duo.,Wang, Qian.,Wang, Zhongjian.,...&Shen, Dashen.(2015).Direct growth of sb2te3 on graphene by atomic layer deposition.Rsc advances,5(50),40007-40011.
MLA Zheng, Li,et al."Direct growth of sb2te3 on graphene by atomic layer deposition".Rsc advances 5.50(2015):40007-40011.

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来源:中国科学院大学

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