Effects of rapid thermal annealing on the properties of hfo2/la2o3 nanolaminate films deposited by plasma enhanced atomic layer deposition
文献类型：期刊论文
| 作者 | Cao, Duo1,2; Cheng, Xinhong1,2; Zheng, Li1,2; Wang, Zhongjian1,2; Xu, Dawei1,2; Xia, Chao1,2; Shen, Lingyan1,2; Wang, Qian1,2; Yu, Yuehui1,2; Shen, DaShen3 |
| 刊名 | Journal of vacuum science & technology a
 |
| 出版日期 | 2015 |
| 卷号 | 33期号:1页码:6 |
| ISSN号 | 0734-2101 |
| DOI | 10.1116/1.4900935 |
| 通讯作者 | Cao, duo() |
| 英文摘要 | In this work, hfo2/la2o3 nanolaminate films were deposited on si substrates by plasma enhanced atomic layer deposition with in situ plasma treatment. different annealing treatments were adopted to change films structure and performance. the upper hfo2 layers in hfo2/la2o3 nanolaminates were easily crystallized after annealing at 800 degrees c, while all the la2o3 layers kept amorphous. x-ray photoelectron spectroscopy results indicated that lao(oh) and la(oh)(3) peaks became weak, h2o molecules in laminates evaporated during high-temperature annealing. band diagram analysis showed that valence band offset and band gap widened after 800 degrees c annealing. annealing, especially 800 degrees c annealing, had gentle effect on leakage current, but could obviously change capacitance and permittivity due to tetragonal and cubic phase formed in the hfo2 film. (c) 2014 american vacuum society. |
| WOS关键词 | THIN-FILMS ; OXIDE-FILMS ; HFO2 ; SILICON |
| WOS研究方向 | Materials Science ; Physics |
| WOS类目 | Materials Science, Coatings & Films ; Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000355735400016 |
| 出版者 | A V S AMER INST PHYSICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2376660 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Cao, Duo |
| 作者单位 | 1.Chinese Acad Sci, SIMIT, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA |
| 推荐引用方式 GB/T 7714 | Cao, Duo,Cheng, Xinhong,Zheng, Li,et al. Effects of rapid thermal annealing on the properties of hfo2/la2o3 nanolaminate films deposited by plasma enhanced atomic layer deposition[J]. Journal of vacuum science & technology a,2015,33(1):6. |
| APA | Cao, Duo.,Cheng, Xinhong.,Zheng, Li.,Wang, Zhongjian.,Xu, Dawei.,...&Shen, DaShen.(2015).Effects of rapid thermal annealing on the properties of hfo2/la2o3 nanolaminate films deposited by plasma enhanced atomic layer deposition.Journal of vacuum science & technology a,33(1),6. |
| MLA | Cao, Duo,et al."Effects of rapid thermal annealing on the properties of hfo2/la2o3 nanolaminate films deposited by plasma enhanced atomic layer deposition".Journal of vacuum science & technology a 33.1(2015):6. |
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来源：中国科学院大学
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