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All-epitaxial growth of single-crystalline ba-0.sr-6(0).4tio3/ir/mgo/si heterostructures

文献类型:期刊论文

作者Chen, TL; Li, XM; Wu, WB; Yao, SD; Wang, K
刊名Journal of crystal growth
出版日期2005-11-15
卷号285期号:1-2页码:1-5
关键词Growth modes Reflection high energy electron diffraction Laser epitaxy Oxides Perovskites Dielectric materials
ISSN号0022-0248
DOI10.1016/j.jcrysgro.2005.08.014
通讯作者Li, xm(lixm@mail.sic.ac.cn)
英文摘要Crystalline quality of thin films can be mediated by their growth modes and crystallographic orientations. normally, a growth mode of layer-by-layer can effectively suppress formations of defects (such as domain walls, grain boundaries, column-structures, dislocations, etc.) in thin films, reduce films' surface roughness, and consequently, promote films' crystallinity. such a film grown by layer-by-layer growth mode may exhibit less defects and fiat surfaces, even presenting a single-crystalline nature (single domain). in this paper, we have characterized the crystallinity of pulsed-laser-deposited ba0.6sr0.4tio3/ir/mgo/si heterostructures by x-ray diffraction, atomic force microscopy, reflection high-energy electron diffraction, rutherford backscattering spectrometry and transmission electron microscopy. these investigations show that the heterostructures exhibit not only an epitaxial layer-by-layer growth mode but also a single-crystalline nature. this work demonstrates an effective way in monolithic integration of ba0.6sr0.4tio3 with silicon for frequency agile devices. (c) 2005 elsevier b.v. all rights reserved.
WOS关键词THIN-FILMS ; MGO FILMS ; SI(100) ; BUFFER ; LAYERS ; PLD
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000233152500001
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2377064
专题中国科学院大学
通讯作者Li, XM
作者单位1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
2.Chinese Acad Sci, Grad Sch, Shanghai 200050, Peoples R China
3.Shanghai Univ, Sch Mat Sci & Engn, Shanghai 201800, Peoples R China
4.Peking Univ, Sch Phys, Dept Tech Phys, Beijing 100871, Peoples R China
推荐引用方式
GB/T 7714
Chen, TL,Li, XM,Wu, WB,et al. All-epitaxial growth of single-crystalline ba-0.sr-6(0).4tio3/ir/mgo/si heterostructures[J]. Journal of crystal growth,2005,285(1-2):1-5.
APA Chen, TL,Li, XM,Wu, WB,Yao, SD,&Wang, K.(2005).All-epitaxial growth of single-crystalline ba-0.sr-6(0).4tio3/ir/mgo/si heterostructures.Journal of crystal growth,285(1-2),1-5.
MLA Chen, TL,et al."All-epitaxial growth of single-crystalline ba-0.sr-6(0).4tio3/ir/mgo/si heterostructures".Journal of crystal growth 285.1-2(2005):1-5.

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来源:中国科学院大学

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