Influences of the film thickness on residual stress of the hfo2 thin films
文献类型：期刊论文
| 作者 | Shen Yanming; He Hongbo; Shao Shuying; Fan Zhengxiu; Shao Jianda |
| 刊名 | Rare metal materials and engineering
 |
| 出版日期 | 2007-03-01 |
| 卷号 | 36期号:3页码:412-415 |
| 关键词 | Hfo2 thin film Residual stress Thin film thickness Electron beam evaporation |
| ISSN号 | 1002-185X |
| 通讯作者 | Shen yanming(shenyamning@mail.siom.ac.cn) |
| 英文摘要 | Hfo2 thin films were prepared by electron beam evaporation. the residual stress was measured by viewing the substrate deflection using zygo interferometer. the microstructure of the hfo2 thin films was inspected by x-ray diffraction (xrd). the results show that the stress is tensile and the value of the residual stress decreases with the increase of the thin film thickness, and residual stress becomes stable when the film thickness reaches a certain value. the interplanar distance of the thin film increases with the increase of the thin film thickness, which is corresponding to the variation of the residual stress. the evolution of the residual stress may be due to the variation of the microstructure as the increasing of the thin film thickness. |
| WOS关键词 | STAINLESS-STEEL ; HAFNIUM OXIDE ; MICROSTRUCTURE ; AG ; CU |
| WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
| WOS类目 | Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000245734700010 |
| 出版者 | NORTHWEST INST NONFERROUS METAL RESEARCH |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2381037 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Shen Yanming |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shen Yanming,He Hongbo,Shao Shuying,et al. Influences of the film thickness on residual stress of the hfo2 thin films[J]. Rare metal materials and engineering,2007,36(3):412-415. |
| APA | Shen Yanming,He Hongbo,Shao Shuying,Fan Zhengxiu,&Shao Jianda.(2007).Influences of the film thickness on residual stress of the hfo2 thin films.Rare metal materials and engineering,36(3),412-415. |
| MLA | Shen Yanming,et al."Influences of the film thickness on residual stress of the hfo2 thin films".Rare metal materials and engineering 36.3(2007):412-415. |
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来源：中国科学院大学
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