Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography
文献类型：期刊论文
| 作者 | Liu, Ke; Li, Yanqiu; Zhang, Fuchang; Fan, Mingzhe |
| 刊名 | Japanese journal of applied physics part 1-regular papers brief communications & review papers
 |
| 出版日期 | 2007-10-01 |
| 卷号 | 46期号:10a页码:6568-6572 |
| 关键词 | Extreme ultraviolet lithography Projection optics Thermal and structural effect Mirror mount Thermo-mechanical analysis Zernike polynomials |
| ISSN号 | 0021-4922 |
| DOI | 10.1143/jjap.46.6568 |
| 通讯作者 | Liu, ke() |
| 英文摘要 | For extreme ultraviolet lithography (euvl) targeting 45 nm technology generation and beyond, thermal absorption is the main source of multi layer-coated mirror structural deformation, which will finally cause degradation of lithographic performance. it becomes necessary to consider thermal absorption issue in the design phase of volume production tool. utilizing several commercial and in-house software packages, we have performed a complete transient thermo-mechanical analysis of such effects and its impact on optical performance for volume production of euvl. this article presents the simulation results based on wafer throughput model of 100 300 mm wafers per hour for the 32 nm technology generation. |
| WOS研究方向 | Physics |
| WOS类目 | Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000250266800019 |
| 出版者 | INST PURE APPLIED PHYSICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2382543 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Liu, Ke |
| 作者单位 | 1.Beijing Inst Technol, Beijing 100081, Peoples R China 2.Chinese Acad Sci, Inst Elect Engn, Beijing 100080, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Ke,Li, Yanqiu,Zhang, Fuchang,et al. Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography[J]. Japanese journal of applied physics part 1-regular papers brief communications & review papers,2007,46(10a):6568-6572. |
| APA | Liu, Ke,Li, Yanqiu,Zhang, Fuchang,&Fan, Mingzhe.(2007).Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography.Japanese journal of applied physics part 1-regular papers brief communications & review papers,46(10a),6568-6572. |
| MLA | Liu, Ke,et al."Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography".Japanese journal of applied physics part 1-regular papers brief communications & review papers 46.10a(2007):6568-6572. |
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来源：中国科学院大学
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