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High temperature annealing effect on structure, optical property and laser-induced damage threshold of ta(2)o(5) films

文献类型:期刊论文

作者Xu, Cheng1,2; Xiao, Qiling1,2; Maa, Jianyong1,2; Jin, Yunxia1; Shao, Jianda1; Fan, Zhengxiu1
刊名Applied surface science
出版日期2008-08-15
卷号254期号:20页码:6554-6559
关键词Ta(2)o(5) films Annealing Laser-induced damage threshold Scattering Absorption
ISSN号0169-4332
DOI10.1016/j.apsusc.2008.04.034
通讯作者Xu, cheng(xucheng@siom.ac.cn)
英文摘要Ta(2)o(5) films were deposited by conventional electron beam evaporation method and then annealed in air at different temperature from 873 to 1273 k. it was found that the film structure changed from amorphous phase to hexagonal phase when annealed at 1073 k, then transformed to orthorhombic phase after annealed at 1273 k. the transmittance was improved after annealed at 873 k, and it decreased as the annealing temperature increased further. the total integrated scattering (tis) tests and afm results showed that both scattering and root mean square (rms) roughness of films increased with the annealing temperature increasing. x-ray photoelectron spectroscopy (xps) analysis showed that the film obtained better stoichiometry and the o/ta ratio increased to 2.50 after annealing. it was found that the laser-induced damage threshold (lidt) increased to the maximum when annealed at 873 k, while it decreased when the annealing temperature increased further. detailed damaged models dominated by different parameters during annealing were discussed. (c) 2008 elsevier b. v. all rights reserved.
WOS关键词PLASMA-DEPOSITED TA2O5 ; NB2O5 FILMS ; MICROSTRUCTURE ; COATINGS ; SI
WOS研究方向Chemistry ; Materials Science ; Physics
WOS类目Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000257950100046
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2385485
专题中国科学院大学
通讯作者Xu, Cheng
作者单位1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Xu, Cheng,Xiao, Qiling,Maa, Jianyong,et al. High temperature annealing effect on structure, optical property and laser-induced damage threshold of ta(2)o(5) films[J]. Applied surface science,2008,254(20):6554-6559.
APA Xu, Cheng,Xiao, Qiling,Maa, Jianyong,Jin, Yunxia,Shao, Jianda,&Fan, Zhengxiu.(2008).High temperature annealing effect on structure, optical property and laser-induced damage threshold of ta(2)o(5) films.Applied surface science,254(20),6554-6559.
MLA Xu, Cheng,et al."High temperature annealing effect on structure, optical property and laser-induced damage threshold of ta(2)o(5) films".Applied surface science 254.20(2008):6554-6559.

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来源:中国科学院大学

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