中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influences of sio2 protective layers and annealing on the laser-induced damage threshold of ta2o5 films

文献类型:期刊论文

作者Xu, Cheng1,2; Dong, Hongcheng1,2; Ma, Jianyong1,2; Jin, Yunxia1; Shao, Jianda1; Fan, Zhengxiu1
刊名Chinese optics letters
出版日期2008-03-10
卷号6期号:3页码:228-230
ISSN号1671-7694
通讯作者Xu, cheng(xucheng@siom.ac.cn)
英文摘要Ta2o5 films are prepared on bk7 substrates with conventional electron beam evaporation deposition. the effects of sio2 protective layers and annealing on the laser-induced damage threshold (lidt) of the films are investigated. the results show that sio2 protective layers exert little influence on the electric field intensity (efi) distribution, microstructure and microdefect density but increase the absorption slightly. annealing is effective on decreasing the microdefect density and the absorption of the films. both sio2 protective layers and annealing are beneficial to the damage resistance of the films and the latter is more effective to improve the lidt. moreover, the maximal lidt of ta2o5 films is achieved by the combination of sio2 protective layers and annealing.
WOS关键词THIN-FILMS ; COATINGS ; NM
WOS研究方向Optics
WOS类目Optics
语种英语
WOS记录号WOS:000255024700022
出版者SCIENCE CHINA PRESS
URI标识http://www.irgrid.ac.cn/handle/1471x/2386589
专题中国科学院大学
通讯作者Xu, Cheng
作者单位1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin Film Coatings, Shanghai 201800, Peoples R China
2.Grad Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Xu, Cheng,Dong, Hongcheng,Ma, Jianyong,et al. Influences of sio2 protective layers and annealing on the laser-induced damage threshold of ta2o5 films[J]. Chinese optics letters,2008,6(3):228-230.
APA Xu, Cheng,Dong, Hongcheng,Ma, Jianyong,Jin, Yunxia,Shao, Jianda,&Fan, Zhengxiu.(2008).Influences of sio2 protective layers and annealing on the laser-induced damage threshold of ta2o5 films.Chinese optics letters,6(3),228-230.
MLA Xu, Cheng,et al."Influences of sio2 protective layers and annealing on the laser-induced damage threshold of ta2o5 films".Chinese optics letters 6.3(2008):228-230.

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来源:中国科学院大学

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