中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Annealing effects on residual stress of wo2/sio2 multilayers

文献类型:期刊论文

作者Shen, Yanming1,2; Han, Zhaoxia3; Shao, Jianda1; Shao, Shuying1; He, Hongbo1
刊名Chinese optics letters
出版日期2008-03-10
卷号6期号:3页码:225-227
ISSN号1671-7694
通讯作者Shen, yanming(shenyanming@siom.ac.cn)
英文摘要Hfo2/sio2 multilayer films were deposited on bk7 glass substrates by electron beam evaporation method. the effects of annealing at the temperature between 200 and 400 degrees c on residual stresses have been studied. it is found that the residual stress of as-deposited hfo2/sio2 multilayers is compressive. it becomes tensile after annealing at 200 degrees c, and then the value of tensile stress increases as annealing temperature increases. and cracks appear in the film because tensile stress is too large when the sample is annealed at 400 degrees c. at the same time, the crystallite size increases and interplanar distance decreases with the increase of annealing temperature. the variation of residual stresses is corresponding with the evolution of structures.
WOS关键词THIN-FILMS ; COATINGS
WOS研究方向Optics
WOS类目Optics
语种英语
WOS记录号WOS:000255024700021
出版者SCIENCE CHINA PRESS
URI标识http://www.irgrid.ac.cn/handle/1471x/2387091
专题中国科学院大学
通讯作者Shen, Yanming
作者单位1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
2.Grad Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Henan Univ Sci & Technol, Sch Sci, Luoyang 471003, Peoples R China
推荐引用方式
GB/T 7714
Shen, Yanming,Han, Zhaoxia,Shao, Jianda,et al. Annealing effects on residual stress of wo2/sio2 multilayers[J]. Chinese optics letters,2008,6(3):225-227.
APA Shen, Yanming,Han, Zhaoxia,Shao, Jianda,Shao, Shuying,&He, Hongbo.(2008).Annealing effects on residual stress of wo2/sio2 multilayers.Chinese optics letters,6(3),225-227.
MLA Shen, Yanming,et al."Annealing effects on residual stress of wo2/sio2 multilayers".Chinese optics letters 6.3(2008):225-227.

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来源:中国科学院大学

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