Laser induced damage threshold at 355 and 1064 nm of ta(2)o(5) films of different phases
文献类型：期刊论文
| 作者 | Xu Cheng1,2; Li Xiao1,2; Dong Hong-Cheng1,2; Jin Yun-Xia1; He Hong-Bo1; Shao Jian-Da1; Fan Zheng-Xiu1 |
| 刊名 | Chinese physics letters
 |
| 出版日期 | 2008-09-01 |
| 卷号 | 25期号:9页码:3300-3303 |
| ISSN号 | 0256-307X |
| 通讯作者 | Xu cheng(xucheng@siom.ac.cn) |
| 英文摘要 | Ta(2)o(5) films are deposited on fused silica substrates by conventional electron beam evaporation method. by annealing at different temperatures, ta(2)o(5) films of amorphous, hexagonal and orthorhombic phases are obtained and confirmed by x-ray diffractometer ( xrd) results. x-ray photoelectron spectroscopy ( xps) analysis shows that chemical composition of all the films is stoichiometry. it is found that the amorphous ta(2)o(5) film achieves the highest laser induced damage threshold ( lidt) either at 355 or 1064 nm, followed by hexagonal phase and finally orthorhombic phase. the damage morphologies at 355 and 1064 nm are different as the former shows a uniform fused area while the latter is centred on one or more defect points, which is induced by different damage mechanisms. the decrease of the lidt at 1064nm is attributed to the increasing structural defect, while at 355nm is due to the combination effect of the increasing structural defect and decreasing band gap energy. |
| WOS关键词 | OPTICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; TEMPERATURE ; SI |
| WOS研究方向 | Physics |
| WOS类目 | Physics, Multidisciplinary |
| 语种 | 英语 |
| WOS记录号 | WOS:000258916400055 |
| 出版者 | IOP PUBLISHING LTD |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2388366 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Xu Cheng |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu Cheng,Li Xiao,Dong Hong-Cheng,et al. Laser induced damage threshold at 355 and 1064 nm of ta(2)o(5) films of different phases[J]. Chinese physics letters,2008,25(9):3300-3303. |
| APA | Xu Cheng.,Li Xiao.,Dong Hong-Cheng.,Jin Yun-Xia.,He Hong-Bo.,...&Fan Zheng-Xiu.(2008).Laser induced damage threshold at 355 and 1064 nm of ta(2)o(5) films of different phases.Chinese physics letters,25(9),3300-3303. |
| MLA | Xu Cheng,et al."Laser induced damage threshold at 355 and 1064 nm of ta(2)o(5) films of different phases".Chinese physics letters 25.9(2008):3300-3303. |
入库方式： iSwitch采集
来源：中国科学院大学
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。