中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of methane flow on the microstructure and properties of tial-doped a-c:h films deposited by middle frequency reactive magnetron sputtering

文献类型:期刊论文

作者Pang, Xianjuan1,2; Shi, Lei1; Wang, Peng1; Xia, Yanqiu1; Liu, Weimin1
刊名Surface and interface analysis
出版日期2009-12-01
卷号41期号:12-13页码:924-930
ISSN号0142-2421
关键词Magnetron sputtering Hydrogenated tial-doped a-c:h film Structure Tribological properties
DOI10.1002/sia.3120
通讯作者Liu, weimin(wmliu@lzb.ac.cn)
英文摘要Hydrogenated tial-doped a-c:h films were deposited on si substrates by middle frequency magnetron sputtering tial target in argon and methane gas mixture atmosphere. the surface morphology, hardness, chemical nature and bond types of the films were characterized by means of atomic force microscopy (afm), xps, raman spectroscopy and nanoindentation. the friction and wear behaviors of the deposited films were characterized on an umt-2mt test system. sem was utilized to analyze the wear scar and debris on steel balls after sliding on the deposited films under dry friction conditions. the wear rate of the deposited films was calculated from traces of surface profiles taken across the wear track using an optical profile. the results demonstrated that the film deposited at 60 sccm methane flow exhibited higher hardness, as well as low friction coefficient and wear rate, which is attributed to the formation of a graphitized transfer layer. copyright (c) 2009 john wiley & sons, ltd.
WOS关键词DIAMOND-LIKE CARBON ; CATHODIC VACUUM-ARC ; AMORPHOUS-CARBON ; MECHANICAL-PROPERTIES ; NANOCOMPOSITE FILMS ; BIAS VOLTAGE ; THIN-FILMS ; COMPOSITE FILMS ; SUBSTRATE BIAS ; H FILMS
WOS研究方向Chemistry
WOS类目Chemistry, Physical
语种英语
出版者JOHN WILEY & SONS LTD
WOS记录号WOS:000272578600004
URI标识http://www.irgrid.ac.cn/handle/1471x/2395248
专题中国科学院大学
通讯作者Liu, Weimin
作者单位1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
推荐引用方式
GB/T 7714
Pang, Xianjuan,Shi, Lei,Wang, Peng,et al. Influence of methane flow on the microstructure and properties of tial-doped a-c:h films deposited by middle frequency reactive magnetron sputtering[J]. Surface and interface analysis,2009,41(12-13):924-930.
APA Pang, Xianjuan,Shi, Lei,Wang, Peng,Xia, Yanqiu,&Liu, Weimin.(2009).Influence of methane flow on the microstructure and properties of tial-doped a-c:h films deposited by middle frequency reactive magnetron sputtering.Surface and interface analysis,41(12-13),924-930.
MLA Pang, Xianjuan,et al."Influence of methane flow on the microstructure and properties of tial-doped a-c:h films deposited by middle frequency reactive magnetron sputtering".Surface and interface analysis 41.12-13(2009):924-930.

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来源:中国科学院大学

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