Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image
文献类型：期刊论文
| 作者 | Peng, Bo1,2; Wang, Xiangzhao1,2; Qiu, Zicheng1,2; Cao, Yuting1,2; Duan, Lifeng3 |
| 刊名 | Applied optics
 |
| 出版日期 | 2010-05-20 |
| 卷号 | 49期号:15页码:2753-2760 |
| ISSN号 | 1559-128X |
| DOI | 10.1364/ao.49.002753 |
| 通讯作者 | Wang, xiangzhao(wxz26267@siom.ac.cn) |
| 英文摘要 | We propose an in situ technique for measuring an even aberration of lithographic projection optics. by using the hopkins theory of partially coherent imaging and the thick-mask model, the linear relationship between the intensity difference of adjacent peaks in an alternating phase-shifting mask image and an even aberration is established by equations and verified by numerical results. the sensitivity of measuring the even aberration of lithographic projection optics based on this linear relationship is analyzed, and the measurement mark is designed accordingly. measurement performance of the present technique is evaluated using the lithographic simulator prolith, which shows that the present technique is capable of measuring the even aberration of lithographic projection optics with ultrahigh measurement accuracy. (c) 2010 optical society of america |
| WOS关键词 | MONITOR ; TOOLS |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000277883700004 |
| 出版者 | OPTICAL SOC AMER |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2405904 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Wang, Xiangzhao |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Informat Opt Lab, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China 3.Natl Engn Res Ctr Lithog Equipment, Shanghai 201203, Peoples R China |
| 推荐引用方式 GB/T 7714 | Peng, Bo,Wang, Xiangzhao,Qiu, Zicheng,et al. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image[J]. Applied optics,2010,49(15):2753-2760. |
| APA | Peng, Bo,Wang, Xiangzhao,Qiu, Zicheng,Cao, Yuting,&Duan, Lifeng.(2010).Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image.Applied optics,49(15),2753-2760. |
| MLA | Peng, Bo,et al."Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image".Applied optics 49.15(2010):2753-2760. |
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来源：中国科学院大学
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