The effects of sputtering power on optical and electrical properties of copper selenide thin films deposited by magnetron sputtering
文献类型：期刊论文
| 作者 | Li, Y. Z.1,2; Gao, X. D.1; Yang, C.1,2; Huang, F. Q.1,2 |
| 刊名 | Journal of alloys and compounds
 |
| 出版日期 | 2010-09-03 |
| 卷号 | 505期号:2页码:623-627 |
| 关键词 | Copper selenide thin films Magnetron sputtering Optical band-gap Electrical resistivity |
| ISSN号 | 0925-8388 |
| DOI | 10.1016/j.jallcom.2010.06.094 |
| 通讯作者 | Li, y. z.(leeyuntse@sina.com) |
| 英文摘要 | The p-type copper selenide thin films were deposited on glass substrate at room temperature by magnetron sputtering. the effects of sputtering power on crystallinity, surface morphology, optical and electrical properties of the copper selenide thin films were investigated. by adjusting the sputtering power, the thickness of as-deposited films varied between 225 nm and 375 nm. the crystallinity, the optical band-gap as well as the electrical conductivity of the as-deposited films were improved substantially. the copper selenide thin film deposited under optimal sputtering power possesses best crystallinity, widest optical band-gap of 2.40 ev and lowest electrical resistivity of 3.94 x 10(-4) omega cm. crown copyright (c) 2010 published by elsevier b.v. all rights reserved. |
| WOS关键词 | ROOM-TEMPERATURE |
| WOS研究方向 | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
| WOS类目 | Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000281738000049 |
| 出版者 | ELSEVIER SCIENCE SA |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2406013 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Li, Y. Z. |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Y. Z.,Gao, X. D.,Yang, C.,et al. The effects of sputtering power on optical and electrical properties of copper selenide thin films deposited by magnetron sputtering[J]. Journal of alloys and compounds,2010,505(2):623-627. |
| APA | Li, Y. Z.,Gao, X. D.,Yang, C.,&Huang, F. Q..(2010).The effects of sputtering power on optical and electrical properties of copper selenide thin films deposited by magnetron sputtering.Journal of alloys and compounds,505(2),623-627. |
| MLA | Li, Y. Z.,et al."The effects of sputtering power on optical and electrical properties of copper selenide thin films deposited by magnetron sputtering".Journal of alloys and compounds 505.2(2010):623-627. |
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来源：中国科学院大学
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