Effects of a tio2 buffer layer on solution-deposited vo2 films: enhanced oxidization durability
文献类型：期刊论文
| 作者 | Zhang, Zongtao1,2; Gao, Yanfeng1; Kang, Litao1,2; Du, Jing1,2; Luo, Hongjie1 |
| 刊名 | Journal of physical chemistry c
 |
| 出版日期 | 2010-12-23 |
| 卷号 | 114期号:50页码:22214-22220 |
| ISSN号 | 1932-7447 |
| DOI | 10.1021/jp108449m |
| 通讯作者 | Gao, yanfeng(yfgao@mail.sic.ac.cn) |
| 英文摘要 | In this article, thermochromic vo2 films were deposited on fused quartz and rutile tio2-buffered fused quartz substrates via a solution-phase process. the incorporation of a tio2 buffer layer endures an enhanced oxidization durability of vo2 films under an environment with high oxygen partial pressures. oxidization in furnace during a cooling stage and rapid thermal oxidization (rto) treatments were employed to investigate the evolution of microstructures and compositions of the films in the gradual oxidization processes. oxidization treatments transformed vo2 into v2o5 for films grown on fused quartz substrates, whereas the oxidation process was significantly hindered for films prepared on a tio2 buffer layer, especially around the vo2/tio2 interface. the phenomenon is first reported in this article and is important for practical applications. |
| WOS关键词 | CHEMICAL-VAPOR-DEPOSITION ; INTELLIGENT WINDOW COATINGS ; METAL-INSULATOR TRANSITIONS ; OXIDE THIN-FILMS ; VANADIUM DIOXIDE ; OPTICAL-PROPERTIES ; PHASE-TRANSITION ; MULTIFUNCTIONAL WINDOW ; RAMAN-SPECTROSCOPY ; TRANSFORMATION |
| WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science |
| WOS类目 | Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
| 语种 | 英语 |
| WOS记录号 | WOS:000285236800045 |
| 出版者 | AMER CHEMICAL SOC |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2408613 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Gao, Yanfeng |
| 作者单位 | 1.Chinese Acad Sci, State Key Lab High Performance Ceram & Superfine, Shanghai Inst Ceram, Shanghai 200050, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Zongtao,Gao, Yanfeng,Kang, Litao,et al. Effects of a tio2 buffer layer on solution-deposited vo2 films: enhanced oxidization durability[J]. Journal of physical chemistry c,2010,114(50):22214-22220. |
| APA | Zhang, Zongtao,Gao, Yanfeng,Kang, Litao,Du, Jing,&Luo, Hongjie.(2010).Effects of a tio2 buffer layer on solution-deposited vo2 films: enhanced oxidization durability.Journal of physical chemistry c,114(50),22214-22220. |
| MLA | Zhang, Zongtao,et al."Effects of a tio2 buffer layer on solution-deposited vo2 films: enhanced oxidization durability".Journal of physical chemistry c 114.50(2010):22214-22220. |
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来源：中国科学院大学
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