Evolution of stress in evaporated silicon dioxide thin films
文献类型：期刊论文
| 作者 | Fang, Ming1,2; Hu, Dafei1,2; Shao, Jianda1 |
| 刊名 | Chinese optics letters
 |
| 出版日期 | 2010-01-10 |
| 卷号 | 8期号:1页码:119-122 |
| ISSN号 | 1671-7694 |
| DOI | 10.3788/col20100801.0119 |
| 通讯作者 | Fang, ming(fm@siom.ac.cn) |
| 英文摘要 | The evolution of stress in evaporated sio(2), used as optical coatings, is investigated experimentally through in situ stress measurement. a typical evolution pattern consisting of five subprocedures (thin film deposition, stopping deposition, cooling, venting the vacuum chamber, and exposing coated optics to the atmosphere) is put forward. further investigations into the subprocedures reveal their features. during the deposition stage, the stresses are usually compressive and reach a stable state when the deposited film is thicker than 100 nm. an increment of compressive stress value is observed with the decrease of residual gas pressure or deposition rate. a very low stress of -20 mpa is formed in sio(2) films deposited at 3 x 10(-2) pa. after deposition, the stress increases slightly in the compressive direction and is subject to the stabilization in subsequent tens of minutes. in the process of venting and exposure, the compressive component increases rapidly with the admission of room air and then reaches saturation, followed by a logarithmic decrement of the compressive state in the succeeding hours. an initial discussion of these behaviors is given. |
| WOS关键词 | RESIDUAL-STRESS ; MULTILAYERS ; DEPOSITION |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000274323600032 |
| 出版者 | CHINESE OPTICS LETTERS MANUSCRIPT OFFICE |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2411050 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Fang, Ming |
| 作者单位 | 1.Chinese Acad Sci, Key Lab Mat Sci & Technol High Power Lasers, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Fang, Ming,Hu, Dafei,Shao, Jianda. Evolution of stress in evaporated silicon dioxide thin films[J]. Chinese optics letters,2010,8(1):119-122. |
| APA | Fang, Ming,Hu, Dafei,&Shao, Jianda.(2010).Evolution of stress in evaporated silicon dioxide thin films.Chinese optics letters,8(1),119-122. |
| MLA | Fang, Ming,et al."Evolution of stress in evaporated silicon dioxide thin films".Chinese optics letters 8.1(2010):119-122. |
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来源：中国科学院大学
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