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Chinese Academy of Sciences Institutional Repositories Grid
Structure and characteristics of amorphous (ti,si)-c:h films deposited by reactive magnetron sputtering

文献类型:期刊论文

作者Jiang, Jinlong1,2,3; Hao, Junying1; Pang, Xianjuan1,2; Wang, Peng1; Liu, Weimin1
刊名Diamond and related materials
出版日期2010-10-01
卷号19期号:10页码:1172-1177
关键词Amorphous hydrogenated carbon Doping Microstructure Superlow friction
ISSN号0925-9635
DOI10.1016/j.diamond.2010.05.005
通讯作者Liu, weimin(wmliu@lzb.ac.cn)
英文摘要The hydrogenated amorphous carbon films doped with ti and si ((ti,si)-c:h) were deposited on silicon substrates using reactive magnetron sputtering ti(80)si(20) composite target in an argon and methane gas mixture. the structures of the films were analyzed by x-ray photoelectron spectroscopy and visible raman spectroscopy. the morphologies were observed by atomic force microscope. the friction coefficients of the films were tested on the ball-on-disc tribometer. the results indicate that the sp(3)/sp(2) ratios in the films can be varied from 0.18 to 0.63 by changing ti and si contents at various ch(4) flow rates. the surface of the films becomes smoother and more compact as the ch4 flow rate increases. the lowest friction coefficient is as low as 0.0139 for the film with ti of 4.5 at.% and si of 1.0 at.%. especially, the film exhibits a superlow value (mu<0.01) under ambient air with 40% relative humidity in friction process. the superlow friction coefficient in ambient air may be, attributable to synergistic effects of a combination of ti and si in the film. crown copyright (c) 2010 published by elsevier b.v. all rights reserved.
WOS关键词DIAMOND-LIKE CARBON ; H THIN-FILMS ; TRIBOLOGICAL BEHAVIOR ; DLC FILMS ; COATINGS ; NANOCOMPOSITE ; MICROSTRUCTURE ; SPECTRA ; STRESS ; RAMAN
WOS研究方向Materials Science
WOS类目Materials Science, Multidisciplinary
语种英语
WOS记录号WOS:000282203300008
出版者ELSEVIER SCIENCE SA
URI标识http://www.irgrid.ac.cn/handle/1471x/2412383
专题中国科学院大学
通讯作者Liu, Weimin
作者单位1.Chinese Acad Sci, State Key Lab Solid Lubricat, Lanzhou Inst Chem Phys, Lanzhou 730000, Peoples R China
2.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Jiang, Jinlong,Hao, Junying,Pang, Xianjuan,et al. Structure and characteristics of amorphous (ti,si)-c:h films deposited by reactive magnetron sputtering[J]. Diamond and related materials,2010,19(10):1172-1177.
APA Jiang, Jinlong,Hao, Junying,Pang, Xianjuan,Wang, Peng,&Liu, Weimin.(2010).Structure and characteristics of amorphous (ti,si)-c:h films deposited by reactive magnetron sputtering.Diamond and related materials,19(10),1172-1177.
MLA Jiang, Jinlong,et al."Structure and characteristics of amorphous (ti,si)-c:h films deposited by reactive magnetron sputtering".Diamond and related materials 19.10(2010):1172-1177.

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来源:中国科学院大学

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