Damage characteristics of hfo2/sio2 high reflector at 45 degrees incidence in 1-on-1 and n-on-1 tests
文献类型：期刊论文
| 作者 | Liu, Xiaofeng1,2; Li, Dawei1; Zhao, Yuan'an1; Li, Xiao1,2; Ling, Xiulan1,2; Shao, Jianda1 |
| 刊名 | Chinese optics letters
 |
| 出版日期 | 2010-01-10 |
| 卷号 | 8期号:1页码:41-44 |
| ISSN号 | 1671-7694 |
| DOI | 10.3788/col20100801.0041 |
| 通讯作者 | Liu, xiaofeng(xiaofeng198225@163.com) |
| 英文摘要 | P-polarization high reflectors are deposited by e-beam from hafnia and silica. 1-on-1 and n-on-1 tests at 1064-nm wavelength with p-polarization at 45 degrees incidence are carried out on these samples. microscope and scanning electron microscope are applied to investigate the damage morphologies in both 1-on-1 and n-on-1 tests. it is found that the laser damage threshold is higher in n-on-1 tests and nodular defect is the main inducement that leads to the damage because nodular ejection with plasma scalding is the typical damage morphology. similar damage morphology observed in the two tests indicates that the higher laser damage threshold in n-on-1 test is attributed to the mechanical stabilization process of nodular defects, owing to the gradually increased laser fluence radiation. based on the typical morphology study, some process optimizations are given. |
| WOS关键词 | LASER-INDUCED DAMAGE ; BEAM EVAPORATION ; COATINGS ; THRESHOLD ; MIRROR |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000274323600012 |
| 出版者 | CHINESE LASER PRESS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2414414 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Liu, Xiaofeng |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Xiaofeng,Li, Dawei,Zhao, Yuan'an,et al. Damage characteristics of hfo2/sio2 high reflector at 45 degrees incidence in 1-on-1 and n-on-1 tests[J]. Chinese optics letters,2010,8(1):41-44. |
| APA | Liu, Xiaofeng,Li, Dawei,Zhao, Yuan'an,Li, Xiao,Ling, Xiulan,&Shao, Jianda.(2010).Damage characteristics of hfo2/sio2 high reflector at 45 degrees incidence in 1-on-1 and n-on-1 tests.Chinese optics letters,8(1),41-44. |
| MLA | Liu, Xiaofeng,et al."Damage characteristics of hfo2/sio2 high reflector at 45 degrees incidence in 1-on-1 and n-on-1 tests".Chinese optics letters 8.1(2010):41-44. |
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来源：中国科学院大学
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