Chemical liquid phase deposition of thin aluminum oxide films
文献类型：期刊论文
| 作者 | Sun, J; Sun, YC |
| 刊名 | Chinese journal of chemistry
 |
| 出版日期 | 2004-07-01 |
| 卷号 | 22期号:7页码:661-667 |
| 关键词 | Aluminum oxide Chemical liquid phase deposition Ph value Electron dispersion spectroscopy Fourier transform infrared spectrum X-ray diffraction Scanning electron microscopy |
| ISSN号 | 1001-604X |
| 通讯作者 | Sun, j(albertjefferson@sohu.com) |
| 英文摘要 | Thin aluminum oxide films were deposited by a new and simple physicochemical method called chemical liquid phase deposition (cld) on semiconductor materials. aluminum sulfate with crystallized water and sodium bicarbonate were used as precursors for film growth, and the control of the system's ph value played an important role in this experiment. the growth rate is 12 nm/h with the deposition at [al-2(so4)(3)]=0.0837 mol.l-1, [nahco3]=0.214 mol.l-1, 15 degreesc. post-growth annealing not only densifies and purifies the films, but results in film crystallization as well. excellent quality of al2o3 films in this work is supported by electron dispersion spectroscopy, fourier transform infrared spectrum, x-ray diffraction spectrum and scanning electron microscopy photograph. |
| WOS关键词 | ROOM-TEMPERATURE DEPOSITION ; SILICON DIOXIDE FILMS ; GALLIUM-ARSENIDE ; VAPOR-DEPOSITION ; AQUEOUS-SOLUTION ; GATE INSULATOR ; PASSIVATION ; SIO2-FILMS ; SIO2-XFX |
| WOS研究方向 | Chemistry |
| WOS类目 | Chemistry, Multidisciplinary |
| 语种 | 英语 |
| WOS记录号 | WOS:000222627800009 |
| 出版者 | SCIENCE CHINA PRESS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426221 |
| 专题 | 半导体研究所 |
| 通讯作者 | Sun, J |
| 作者单位 | 1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China 2.Shandong Univ, Dept Foreign Languages, Shandong 264209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Sun, J,Sun, YC. Chemical liquid phase deposition of thin aluminum oxide films[J]. Chinese journal of chemistry,2004,22(7):661-667. |
| APA | Sun, J,&Sun, YC.(2004).Chemical liquid phase deposition of thin aluminum oxide films.Chinese journal of chemistry,22(7),661-667. |
| MLA | Sun, J,et al."Chemical liquid phase deposition of thin aluminum oxide films".Chinese journal of chemistry 22.7(2004):661-667. |
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来源：半导体研究所
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