中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Chemical liquid phase deposition of thin aluminum oxide films

文献类型:期刊论文

作者Sun, J; Sun, YC
刊名Chinese journal of chemistry
出版日期2004-07-01
卷号22期号:7页码:661-667
关键词Aluminum oxide Chemical liquid phase deposition Ph value Electron dispersion spectroscopy Fourier transform infrared spectrum X-ray diffraction Scanning electron microscopy
ISSN号1001-604X
通讯作者Sun, j(albertjefferson@sohu.com)
英文摘要Thin aluminum oxide films were deposited by a new and simple physicochemical method called chemical liquid phase deposition (cld) on semiconductor materials. aluminum sulfate with crystallized water and sodium bicarbonate were used as precursors for film growth, and the control of the system's ph value played an important role in this experiment. the growth rate is 12 nm/h with the deposition at [al-2(so4)(3)]=0.0837 mol.l-1, [nahco3]=0.214 mol.l-1, 15 degreesc. post-growth annealing not only densifies and purifies the films, but results in film crystallization as well. excellent quality of al2o3 films in this work is supported by electron dispersion spectroscopy, fourier transform infrared spectrum, x-ray diffraction spectrum and scanning electron microscopy photograph.
WOS关键词ROOM-TEMPERATURE DEPOSITION ; SILICON DIOXIDE FILMS ; GALLIUM-ARSENIDE ; VAPOR-DEPOSITION ; AQUEOUS-SOLUTION ; GATE INSULATOR ; PASSIVATION ; SIO2-FILMS ; SIO2-XFX
WOS研究方向Chemistry
WOS类目Chemistry, Multidisciplinary
语种英语
WOS记录号WOS:000222627800009
出版者SCIENCE CHINA PRESS
URI标识http://www.irgrid.ac.cn/handle/1471x/2426221
专题半导体研究所
通讯作者Sun, J
作者单位1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
2.Shandong Univ, Dept Foreign Languages, Shandong 264209, Peoples R China
推荐引用方式
GB/T 7714
Sun, J,Sun, YC. Chemical liquid phase deposition of thin aluminum oxide films[J]. Chinese journal of chemistry,2004,22(7):661-667.
APA Sun, J,&Sun, YC.(2004).Chemical liquid phase deposition of thin aluminum oxide films.Chinese journal of chemistry,22(7),661-667.
MLA Sun, J,et al."Chemical liquid phase deposition of thin aluminum oxide films".Chinese journal of chemistry 22.7(2004):661-667.

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来源:半导体研究所

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