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Photoinduced voltage shift in a three-barrier, two-well resonant tunneling structure integrated with a 1.2-mu m-thick n-type gaas layer

文献类型:期刊论文

作者Zhou, X; Zheng, HZ; Li, GR; Hu, B; Gan, HD; Zhu, H
刊名Physica e-low-dimensional systems & nanostructures
出版日期2005-08-01
卷号28期号:3页码:242-246
关键词Photoinduced Voltage shift Resonant tunneling structure
ISSN号1386-9477
DOI10.1016/j.physe.2005.03.002
通讯作者Zhou, x(zxia@red.semi.ac.cn)
英文摘要By integrating a three-barrier, two-well resonant tunneling structure with a 1.2-mu m-thick, slightly doped n-gaas layer, a photoinduced voltage shift on the order of magnitude of 100 mv in resonant current peaks has been verified at an irradiance of low light power density. the 1.2-mu m-thick, slightly doped n-gaas layer manifests itself of playing an important role in enhancing photoelectric sensitivity. (c) 2005 elsevier b.v. all rights reserved.
WOS关键词CIRCUITS ; DIODES
WOS研究方向Science & Technology - Other Topics ; Physics
WOS类目Nanoscience & Nanotechnology ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000230627400007
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2426302
专题半导体研究所
通讯作者Zhou, X
作者单位Chinese Acad Sci, Inst Semicond, State Key Superlattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhou, X,Zheng, HZ,Li, GR,et al. Photoinduced voltage shift in a three-barrier, two-well resonant tunneling structure integrated with a 1.2-mu m-thick n-type gaas layer[J]. Physica e-low-dimensional systems & nanostructures,2005,28(3):242-246.
APA Zhou, X,Zheng, HZ,Li, GR,Hu, B,Gan, HD,&Zhu, H.(2005).Photoinduced voltage shift in a three-barrier, two-well resonant tunneling structure integrated with a 1.2-mu m-thick n-type gaas layer.Physica e-low-dimensional systems & nanostructures,28(3),242-246.
MLA Zhou, X,et al."Photoinduced voltage shift in a three-barrier, two-well resonant tunneling structure integrated with a 1.2-mu m-thick n-type gaas layer".Physica e-low-dimensional systems & nanostructures 28.3(2005):242-246.

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来源:半导体研究所

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