中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Investigation of mn-implanted n-si by low-energy ion beam deposition

文献类型:期刊论文

作者Liu, LF; Chen, NF; Song, SL; Yin, ZG; Yang, F; Chai, CL; Yang, SY; Liu, ZK
刊名Journal of crystal growth
出版日期2005-01-03
卷号273期号:3-4页码:458-463
关键词Auger electron spectroscopy X-ray diffraction Low-energy ion beam deposition Semiconducting silicon
ISSN号0022-0248
DOI10.1016/j.jcrysgro.2004.09.039
通讯作者Liu, lf(lfliu@red.semi.ac.cn)
英文摘要Mn ions were implanted to n-type si(0 0 1) single crystal by low-energy ion beam deposition technique with an energy of 1000 ev and a dose of 7.5 x 10(17) cm(-2). the samples were held at room temperature and at 300degreesc during implantation. auger electron spectroscopy depth profiles of samples indicate that the mn ions reach deeper in the sample implanted at 300degreesc than in the sample implanted at room temperature. x-ray diffraction measurements show that the structure of the sample implanted at room temperature is amorphous while that of the sample implanted at 300degreesc is crystallized. there are no new phases found except silicon both in the two samples. atomic force microscopy images of samples indicate that the sample implanted at 300degreesc has island-like humps that cover the sample surface while there is no such kind of characteristic in the sample implanted at room temperature. the magnetic properties of samples were investigated by alternating gradient magnetometer (agm). the sample implanted at 300degreesc shows ferromagnetic behavior at room temperature. (c) 2004 elsevier bn. all rights reserved.
WOS关键词SPIN-PHOTONICS ; THIN-FILMS ; SEMICONDUCTOR ; GROWTH ; GAS ; CE
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000226243100018
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2426370
专题半导体研究所
通讯作者Liu, LF
作者单位1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
2.Chinese Acad Sci, Inst Mech, Natl Lab Micrograv, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Liu, LF,Chen, NF,Song, SL,et al. Investigation of mn-implanted n-si by low-energy ion beam deposition[J]. Journal of crystal growth,2005,273(3-4):458-463.
APA Liu, LF.,Chen, NF.,Song, SL.,Yin, ZG.,Yang, F.,...&Liu, ZK.(2005).Investigation of mn-implanted n-si by low-energy ion beam deposition.Journal of crystal growth,273(3-4),458-463.
MLA Liu, LF,et al."Investigation of mn-implanted n-si by low-energy ion beam deposition".Journal of crystal growth 273.3-4(2005):458-463.

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来源:半导体研究所

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