中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate

文献类型:期刊论文

作者Wei, QQ; Xue, CS; Sun, ZC; Cao, WT; Zhuang, HH
刊名Rare metal materials and engineering
出版日期2005-02-01
卷号34期号:2页码:312-315
关键词Gan Ga2o3/al2o3 film Ammoniating Magnetron sputtering
ISSN号1002-185X
通讯作者Wei, qq()
英文摘要Gallium nitride (gan) films have been successfully fabricated on silicon (111) substrates through ammoniating ga2o3/al2o3 films deposited by rf magnetron sputtering. the formed films were characterized by fourier transform infrared (ftir) transmission spectroscopy, x-ray diffraction (xrd), x-ray photoelectron spectroscopy (xps), scanning electron microscopy (sem) and photo luminescence spectrum(pl). the results indicate that the films formed are polycrystalline gan with hexagonal wurtzite structure.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; EPITAXIAL-GROWTH ; PHASE EPITAXY ; BEAM EPITAXY ; BUFFER ; LAYERS
WOS研究方向Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
语种英语
WOS记录号WOS:000227367700035
出版者NORTHWEST INST NONFERROUS METAL RESEARCH
URI标识http://www.irgrid.ac.cn/handle/1471x/2426438
专题半导体研究所
通讯作者Wei, QQ
作者单位Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China
推荐引用方式
GB/T 7714
Wei, QQ,Xue, CS,Sun, ZC,et al. Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate[J]. Rare metal materials and engineering,2005,34(2):312-315.
APA Wei, QQ,Xue, CS,Sun, ZC,Cao, WT,&Zhuang, HH.(2005).Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate.Rare metal materials and engineering,34(2),312-315.
MLA Wei, QQ,et al."Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate".Rare metal materials and engineering 34.2(2005):312-315.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。