Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate
文献类型:期刊论文
作者 | Wei, QQ; Xue, CS; Sun, ZC; Cao, WT; Zhuang, HH |
刊名 | Rare metal materials and engineering
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出版日期 | 2005-02-01 |
卷号 | 34期号:2页码:312-315 |
关键词 | Gan Ga2o3/al2o3 film Ammoniating Magnetron sputtering |
ISSN号 | 1002-185X |
通讯作者 | Wei, qq() |
英文摘要 | Gallium nitride (gan) films have been successfully fabricated on silicon (111) substrates through ammoniating ga2o3/al2o3 films deposited by rf magnetron sputtering. the formed films were characterized by fourier transform infrared (ftir) transmission spectroscopy, x-ray diffraction (xrd), x-ray photoelectron spectroscopy (xps), scanning electron microscopy (sem) and photo luminescence spectrum(pl). the results indicate that the films formed are polycrystalline gan with hexagonal wurtzite structure. |
WOS关键词 | CHEMICAL-VAPOR-DEPOSITION ; EPITAXIAL-GROWTH ; PHASE EPITAXY ; BEAM EPITAXY ; BUFFER ; LAYERS |
WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
WOS类目 | Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
语种 | 英语 |
WOS记录号 | WOS:000227367700035 |
出版者 | NORTHWEST INST NONFERROUS METAL RESEARCH |
URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426438 |
专题 | 半导体研究所 |
通讯作者 | Wei, QQ |
作者单位 | Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China |
推荐引用方式 GB/T 7714 | Wei, QQ,Xue, CS,Sun, ZC,et al. Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate[J]. Rare metal materials and engineering,2005,34(2):312-315. |
APA | Wei, QQ,Xue, CS,Sun, ZC,Cao, WT,&Zhuang, HH.(2005).Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate.Rare metal materials and engineering,34(2),312-315. |
MLA | Wei, QQ,et al."Formation of gan film by ammoniating ga2o3/al2o3 deposited on si(111) substrate".Rare metal materials and engineering 34.2(2005):312-315. |
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来源:半导体研究所
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