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Comparison of the properties of gan grown on complex si-based structures

文献类型:期刊论文

作者Zhou, SQ; Vantomme, A; Zhang, BS; Yang, H; Wu, MF
刊名Applied physics letters
出版日期2005-02-21
卷号86期号:8页码:3
ISSN号0003-6951
DOI10.1063/1.1868870
通讯作者Vantomme, a()
英文摘要With the aim of investigating the possible integration of optoelectronic devices, epitaxial gan layers have been grown on si(ill) semiconductor-on-insulator (soi) and on si/cosi2/si(111) using metalorganic chemical vapor deposition. the samples are found to possess a highly oriented wurtzite structure, a uniform thickness, and abrupt interfaces. the epitaxial orientation is determined as gan(0001)//si(111), gan[1120]//si[110], and gan[1010]//si[112], and the gan layer is tensilely strained in the direction parallel to the interface. according to rutherford backscattering/channeling spectrometry and (0002) rocking curves, the crystalline quality of gan on si(111) soi is better than that of gan on silicide. room-temperature photoluminescence of gan/soi reveals a strong near-band-edge emission at 368 nm (3.37 ev) with a full width at half-maximum of 59 mev. (c) 2005 american institute of physics.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; QUALITY GAN ; LAYER
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000227609000026
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2426479
专题半导体研究所
通讯作者Vantomme, A
作者单位1.Katholieke Univ Leuven, Inst Voor Kern Stralingsfys, B-3001 Heverlee, Belgium
2.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
3.Peking Univ, Sch Phys, Dept Tech Phys, Beijing 100871, Peoples R China
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GB/T 7714
Zhou, SQ,Vantomme, A,Zhang, BS,et al. Comparison of the properties of gan grown on complex si-based structures[J]. Applied physics letters,2005,86(8):3.
APA Zhou, SQ,Vantomme, A,Zhang, BS,Yang, H,&Wu, MF.(2005).Comparison of the properties of gan grown on complex si-based structures.Applied physics letters,86(8),3.
MLA Zhou, SQ,et al."Comparison of the properties of gan grown on complex si-based structures".Applied physics letters 86.8(2005):3.

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来源:半导体研究所

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