Fabrication of arrayed waveguide grating based on soi material
文献类型：期刊论文
| 作者 | Fang, Q; Li, F; Liu, YL |
| 刊名 | Journal of infrared and millimeter waves
 |
| 出版日期 | 2005-04-01 |
| 卷号 | 24期号:2页码:143-146 |
| ISSN号 | 1001-9014 |
| 关键词 | Multiplexer/demultiplexer Arrayed waveguide grating ( awg) Channel spacing Central wavelength Adjacent channel crosstalk |
| 通讯作者 | Fang, q() |
| 英文摘要 | An arrayed waveguide grating based on soi material was fabricated by inductive coupled plasma (icp) etching technology. the central wavelength of the device was designed at 1.5509 mu m and the channel spacing was 200 ghz. comparing with the values of the design, the differences of the central wavelength and the channel spacing in the test were 0.28 nm and 0.02 nm, respectively. the adjacent channel crosstalk was about 10 db, and the uniformity of the five channels' insertion loss was only 0.7 db. the results show that the device can be used as a demultiplexer. |
| WOS关键词 | MULTIPLEXER ; AWG ; PRINCIPLES ; SILICON ; PATHS |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| 语种 | 英语 |
| 出版者 | SCIENCE CHINA PRESS |
| WOS记录号 | WOS:000228565000015 |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426522 |
| 专题 | 半导体研究所 |
| 通讯作者 | Fang, Q |
| 作者单位 | Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Fang, Q,Li, F,Liu, YL. Fabrication of arrayed waveguide grating based on soi material[J]. Journal of infrared and millimeter waves,2005,24(2):143-146. |
| APA | Fang, Q,Li, F,&Liu, YL.(2005).Fabrication of arrayed waveguide grating based on soi material.Journal of infrared and millimeter waves,24(2),143-146. |
| MLA | Fang, Q,et al."Fabrication of arrayed waveguide grating based on soi material".Journal of infrared and millimeter waves 24.2(2005):143-146. |
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来源：半导体研究所
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