Fabrication of zno films by radio frequency magnetron sputtering and annealing
文献类型：期刊论文
| 作者 | Gao, HY; Zhuang, HZ; Xue, CS; Wang, SY; Dong, ZH; He, JT |
| 刊名 | Rare metals
 |
| 出版日期 | 2005-09-01 |
| 卷号 | 24期号:3页码:267-271 |
| 关键词 | Zno films Radio frequency magnetron sputtering Annealing Ammonia ambience Buffer layers |
| ISSN号 | 1001-0521 |
| 通讯作者 | Zhuang, hz() |
| 英文摘要 | Zno thin films were deposited on si(111) substrates through a radio frequency (rf) magnetron sputtering system. then the samples were annealed at different temperatures in air ambience and ammonia ambience respectively. the structure and composition of the zno films were studied by x-ray diffraction (xrd) and x-ray photoelectron spectroscopy (xps). the morphology of the samples was studied by scanning electron microscopy (sem). measured results show that zno films with hexagonal wurtzite structure were grown on si(111) substrates when annealed in the two ambiences. the volatilization process of zno in the ammonia ambience at high temperature was discussed and the mechanism of the reaction was analyzed. |
| WOS关键词 | PULSED-LASER DEPOSITION ; ZINC-OXIDE FILMS ; THIN-FILMS ; OPTICAL-PROPERTIES ; SAPPHIRE ; GROWTH ; TEMPERATURE |
| WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
| WOS类目 | Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000232447600013 |
| 出版者 | NONFERROUS METALS SOCIETY CHINA |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426538 |
| 专题 | 半导体研究所 |
| 通讯作者 | Zhuang, HZ |
| 作者单位 | Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China |
| 推荐引用方式 GB/T 7714 | Gao, HY,Zhuang, HZ,Xue, CS,et al. Fabrication of zno films by radio frequency magnetron sputtering and annealing[J]. Rare metals,2005,24(3):267-271. |
| APA | Gao, HY,Zhuang, HZ,Xue, CS,Wang, SY,Dong, ZH,&He, JT.(2005).Fabrication of zno films by radio frequency magnetron sputtering and annealing.Rare metals,24(3),267-271. |
| MLA | Gao, HY,et al."Fabrication of zno films by radio frequency magnetron sputtering and annealing".Rare metals 24.3(2005):267-271. |
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来源：半导体研究所
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