High quality microcrystalline si films by hydrogen dilution profile
文献类型：期刊论文
| 作者 | Gu, Jinhua; Zhu, Meifang; Wang, Liujiu; Liu, Fengzhen; Zhou, Bingqing; Ding, Kun; Li, Guohua |
| 刊名 | Thin solid films
 |
| 出版日期 | 2006-10-25 |
| 卷号 | 515期号:2页码:452-455 |
| 关键词 | Microcrystalline si thin film Hydrogen dilution profiling Incubation layer Uniformity |
| ISSN号 | 0040-6090 |
| DOI | 10.1016/j.tsf.2005.12.255 |
| 通讯作者 | Zhu, meifang(mfzhu@gucas.ac.cn) |
| 英文摘要 | Novel hydrogen dilution profiling (hdp) technique was developed to improve the uniformity in the growth direction of mu c-si:h thin films prepared by hot wire chemical vapor deposition (hwcvd). it was found that the high h dilution ratio reduces the incubation layer from 30 nm to less than 10 nm. a proper design of hydrogen dilution profiling improves the uniformity of crystalline content, x-c, in the growth direction and restrains the formation of micro-voids as well. as a result the compactness of mu c-si:h films with a high crystalline content is enhanced and the stability of mu c-si:h thin film against the oxygen diffusion is much improved. meanwhile the hdp mu c-si:h films exhibit the low defect states. the high nucleation density from high hydrogen dilution at early stage is a critical parameter to improve the quality of mu c-si:h films. (c) 2006 published by elsevier b.v. |
| WOS关键词 | CHEMICAL-VAPOR-DEPOSITION ; THIN ; ALLOYS ; CVD |
| WOS研究方向 | Materials Science ; Physics |
| WOS类目 | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 语种 | 英语 |
| WOS记录号 | WOS:000241220600016 |
| 出版者 | ELSEVIER SCIENCE SA |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426608 |
| 专题 | 半导体研究所 |
| 通讯作者 | Zhu, Meifang |
| 作者单位 | 1.Chinese Acad Sci, Grad Sch, Coll Phys Sci, Beijing 100049, Peoples R China 2.Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Gu, Jinhua,Zhu, Meifang,Wang, Liujiu,et al. High quality microcrystalline si films by hydrogen dilution profile[J]. Thin solid films,2006,515(2):452-455. |
| APA | Gu, Jinhua.,Zhu, Meifang.,Wang, Liujiu.,Liu, Fengzhen.,Zhou, Bingqing.,...&Li, Guohua.(2006).High quality microcrystalline si films by hydrogen dilution profile.Thin solid films,515(2),452-455. |
| MLA | Gu, Jinhua,et al."High quality microcrystalline si films by hydrogen dilution profile".Thin solid films 515.2(2006):452-455. |
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来源：半导体研究所
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