中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation and afm characterization of self-ordered porous alumina films on semi-insulated gaas substrate

文献类型:期刊论文

作者Zhou, H. Y.; Qu, S. C.; Wang, Z. G.; Liang, L. Y.; Cheng, B. C.; Liu, J. P.; Peng, W. Q.
刊名Materials science in semiconductor processing
出版日期2006-02-01
卷号9期号:1-3页码:337-340
关键词Anodic alumina films Semi-insulated gaas substrate Anodization
ISSN号1369-8001
DOI10.1016/j.mssp.2006.01.030
通讯作者Zhou, h. y.(zhouhy@mail.semi.ac.cn)
英文摘要Self-ordered porous alumina films on a semi-insulated gaas substrate were prepared in oxalic acid aqueous solutions by three-step anodization. the i-t curve of anodization process was recorded to observe time effects of anodization. atomic force microscopy was used to investigate structure and morphology of alumina films. it was revealed that the case of oxalic acid resulted in a self-ordered porous structure, with the pore diameters of 60-70 nm, the pore density of the order of about 10(10) pore cm(-2), and interpore distances of 95-100nm. at the same time the pore size and shape change with the pore widening time. field-enhanced dissolution model and theory of deformation relaxation combined were brought forward to be the cause of self-ordered pore structure according to i-t curve of anodization and structure characteristics of porous alumina films. (c) 2006 elsevier ltd. all rights reserved.
WOS关键词MOLECULAR-BEAM EPITAXY ; QUANTUM-DOT LASER ; NANOWIRE ARRAYS ; ANODIC ALUMINA ; ELECTRODEPOSITION ; TEMPLATES ; GAAS(001)
WOS研究方向Engineering ; Materials Science ; Physics
WOS类目Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000238805900070
出版者ELSEVIER SCI LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2426751
专题半导体研究所
通讯作者Zhou, H. Y.
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhou, H. Y.,Qu, S. C.,Wang, Z. G.,et al. Preparation and afm characterization of self-ordered porous alumina films on semi-insulated gaas substrate[J]. Materials science in semiconductor processing,2006,9(1-3):337-340.
APA Zhou, H. Y..,Qu, S. C..,Wang, Z. G..,Liang, L. Y..,Cheng, B. C..,...&Peng, W. Q..(2006).Preparation and afm characterization of self-ordered porous alumina films on semi-insulated gaas substrate.Materials science in semiconductor processing,9(1-3),337-340.
MLA Zhou, H. Y.,et al."Preparation and afm characterization of self-ordered porous alumina films on semi-insulated gaas substrate".Materials science in semiconductor processing 9.1-3(2006):337-340.

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来源:半导体研究所

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