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Chinese Academy of Sciences Institutional Repositories Grid
Evolution of wetting layer in inas/gaas quantum dot system

文献类型:期刊论文

作者Chen, Y. H.; Ye, X. L.; Wang, Z. G.
刊名Nanoscale research letters
出版日期2006-06-01
卷号1期号:1页码:79-83
关键词Quantum dots Wetting layer Reflectance difference spectroscopy Segregation
ISSN号1931-7573
DOI10.1007/s11671-006-9013-9
通讯作者Chen, y. h.(yhchen@red.semi.ac.cn)
英文摘要For inas/gaas quantum dot system, the evolution of the wetting layer (wl) with the inas deposition thickness has been studied by reflectance difference spectroscopy (rds). two transitions related to the heavy-and light-hole in the wl have been distinguished in rd spectra. taking into account the strain and segregation effects, a model has been presented to deduce the inas amount in the wl and the segregation coefficient of the indium atoms from the transition energies of heavy-and light-holes. the variation of the inas amount in the wl and the segregation coefficient are found to rely closely on the growth modes. in addition, the huge dots also exhibits a strong effect on the evolution of the wl. the observed linear dependence of in segregation coefficient upon the inas amount in the wl demonstrates that the segregation is enhanced by the strain in the wl.
WOS研究方向Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000202975800010
出版者SPRINGER
URI标识http://www.irgrid.ac.cn/handle/1471x/2426781
专题半导体研究所
通讯作者Chen, Y. H.
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
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Chen, Y. H.,Ye, X. L.,Wang, Z. G.. Evolution of wetting layer in inas/gaas quantum dot system[J]. Nanoscale research letters,2006,1(1):79-83.
APA Chen, Y. H.,Ye, X. L.,&Wang, Z. G..(2006).Evolution of wetting layer in inas/gaas quantum dot system.Nanoscale research letters,1(1),79-83.
MLA Chen, Y. H.,et al."Evolution of wetting layer in inas/gaas quantum dot system".Nanoscale research letters 1.1(2006):79-83.

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来源:半导体研究所

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