中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation of gan films with the method of magnetron sputtering plus self-assembly reaction mode

文献类型:期刊论文

作者Xue, CS; Dong, ZH; Zhuang, HZ; Wang, SY; Gao, HY; Tian, DH; Wu, YX
刊名Rare metal materials and engineering
出版日期2006-03-01
卷号35期号:3页码:463-466
关键词Magnetron sputtering Self-assemble Gan Intermediate layer
ISSN号1002-185X
通讯作者Xue, cs()
英文摘要Ga2o3 films were deposited onto si (111) substrates with radio frequency (r. f.) magnetron sputtering system. they self-assembled into gan films after reacted with ammonia. the lattice mismatch between substrates and epitaxy layer affects the films' quality. in order to optimize the films, thin sic films as intermediate layers also deposited onto the substrate with magnetron sputtering. the samples intermediate were compared. the results indicate intermediate layer's positive effect to gan films.
WOS研究方向Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
语种英语
WOS记录号WOS:000236600300030
出版者NORTHWEST INST NONFERROUS METAL RESEARCH
URI标识http://www.irgrid.ac.cn/handle/1471x/2426791
专题半导体研究所
通讯作者Xue, CS
作者单位Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China
推荐引用方式
GB/T 7714
Xue, CS,Dong, ZH,Zhuang, HZ,et al. Preparation of gan films with the method of magnetron sputtering plus self-assembly reaction mode[J]. Rare metal materials and engineering,2006,35(3):463-466.
APA Xue, CS.,Dong, ZH.,Zhuang, HZ.,Wang, SY.,Gao, HY.,...&Wu, YX.(2006).Preparation of gan films with the method of magnetron sputtering plus self-assembly reaction mode.Rare metal materials and engineering,35(3),463-466.
MLA Xue, CS,et al."Preparation of gan films with the method of magnetron sputtering plus self-assembly reaction mode".Rare metal materials and engineering 35.3(2006):463-466.

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来源:半导体研究所

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