中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Inductively coupled plasma etching of two-dimensional inp/ingaasp-based photonic crystal

文献类型:期刊论文

作者Ma Xiao-Tao; Zheng Wan-Hua; Ren Gang; Fan Zhong-Chao; Chen Chang-Hui
刊名Acta physica sinica
出版日期2007-02-01
卷号56期号:2页码:977-981
关键词Two-dimensional photonic crystal Inp/ingaasp Inductively coupled plasma C-2/bcl3 Low bias etching
ISSN号1000-3290
通讯作者Zheng wan-hua(whzheng@red.semi.ac.cn)
英文摘要Inductively coupled plasma (icp) etching of inp in cl-2/bcl3 gas mixtures is studied in order to achieve low-damage and high-anisotropy etching of two-dimensional inp/ingaasp photonic crystal. the etching mechanisms are discussed and the effect of plasma heating on wafer during etching is analyzed. it is shown that the balance between the undercut originating from plasma heating and the redeposition of sputtering on the side-wall is crucial for highly anisotropic etching, and the balance point moves toward lower bias when the icp power is increased. high aspect-ratio etching at the dc bias of 203 v is obtained. eventually, photonic crystal structure with nearly 90 degrees side-wall is achieved at low dc bias after optimization of the gas mixture.
WOS关键词BORON-TRICHLORIDE ; CHLORINE ; DENSITY ; SMOOTH
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
WOS记录号WOS:000243986600058
出版者CHINESE PHYSICAL SOC
URI标识http://www.irgrid.ac.cn/handle/1471x/2426929
专题半导体研究所
通讯作者Zheng Wan-Hua
作者单位1.Chinese Acad Sci, Inst Semicond, Nanooptoelect Lab, Beijing 100083, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Ma Xiao-Tao,Zheng Wan-Hua,Ren Gang,et al. Inductively coupled plasma etching of two-dimensional inp/ingaasp-based photonic crystal[J]. Acta physica sinica,2007,56(2):977-981.
APA Ma Xiao-Tao,Zheng Wan-Hua,Ren Gang,Fan Zhong-Chao,&Chen Chang-Hui.(2007).Inductively coupled plasma etching of two-dimensional inp/ingaasp-based photonic crystal.Acta physica sinica,56(2),977-981.
MLA Ma Xiao-Tao,et al."Inductively coupled plasma etching of two-dimensional inp/ingaasp-based photonic crystal".Acta physica sinica 56.2(2007):977-981.

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来源:半导体研究所

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