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Chinese Academy of Sciences Institutional Repositories Grid
Fabrication and structure properties of gan nanowires by ammoniating ga2o3 films

文献类型:期刊论文

作者Xue, Shoubin; Zhuang, Huizhao; Li, Baoli; Hu, Lijun; Zhang, Shiying; Xue, Chengshan
刊名Materials letters
出版日期2007-07-01
卷号61期号:18页码:3867-3869
关键词Gan nanowires Single crystal Ammoniating technique Deposition
ISSN号0167-577X
DOI10.1016/j.matlet.2006.12.049
通讯作者Zhuang, huizhao(zhuanghuizhao@sdnu.edu.cn)
英文摘要The gan nanowires were successfully synthesized on si(111) substrates by ammoniating the ga2o3/zno films at 900 degrees c. the structure and morphology of the as-prepared gan nanowires were studied by x-ray diffraction (xrd), fourier transform infrared spectrum (ftir), scanning electron microscopy (sem) and field-emission transmission electron microscopy (fetem). the results show that the single-crystal gan nanowires have a hexagonal wurtzite structure with lengths of about several micrometers and diameters ranging from 30 nm to 120 nm, which are conducive to the application of nanodevices. finally, the growth mechanism is also briefly discussed. (c) 2006 elsevier b.v. all rights reserved.
WOS关键词GALLIUM NITRIDE ; NANORODS ; ABSORPTION ; GROWTH ; CARBON
WOS研究方向Materials Science ; Physics
WOS类目Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000248189100022
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2426962
专题半导体研究所
通讯作者Zhuang, Huizhao
作者单位Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China
推荐引用方式
GB/T 7714
Xue, Shoubin,Zhuang, Huizhao,Li, Baoli,et al. Fabrication and structure properties of gan nanowires by ammoniating ga2o3 films[J]. Materials letters,2007,61(18):3867-3869.
APA Xue, Shoubin,Zhuang, Huizhao,Li, Baoli,Hu, Lijun,Zhang, Shiying,&Xue, Chengshan.(2007).Fabrication and structure properties of gan nanowires by ammoniating ga2o3 films.Materials letters,61(18),3867-3869.
MLA Xue, Shoubin,et al."Fabrication and structure properties of gan nanowires by ammoniating ga2o3 films".Materials letters 61.18(2007):3867-3869.

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来源:半导体研究所

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