Optimization of gainnas(sb)/gaas quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy
文献类型:期刊论文
作者 | Ni, H. Q.; Niu, Z. C.; Fang, Z. D.; Huang, S. S.; Zhang, S. Y.; Wu, D. H.; Shun, Z.; Han, Q.; Wu, R. H. |
刊名 | Journal of crystal growth
![]() |
出版日期 | 2007-04-01 |
卷号 | 301页码:125-128 |
关键词 | Quantum wells Laser |
ISSN号 | 0022-0248 |
DOI | 10.1016/j.jcrysgro.2006.11.172 |
通讯作者 | Ni, h. q.(nihq@red.semi.ac.cn) |
英文摘要 | The inganas(sb)/(ganas)/gaas quantum wells (qws) emitting at 1.3-1.55 mu m have been grown by molecular beam epitaxy (mbe). the parameters of the radio frequency (rf) such as rf power and flow rate are optimized to reduce the damages from the ions or energetic species. the growth temperature is carefully controlled to prevent the phase segregation and strain relaxation. the effects of sb on the wavelength and quality are investigated. the ganas barrier is used to extend the wavelength and reduce the strain. a 1.5865 mu m inganas(sb)/ganas sqw edge emitting laser lasing at room temperature at continuous wave operation mode is demonstrated. (c) 2006 elsevier b.v. all rights reserved. |
WOS关键词 | ROOM-TEMPERATURE ; GAINNAS ; LASERS ; CELL |
WOS研究方向 | Crystallography ; Materials Science ; Physics |
WOS类目 | Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied |
语种 | 英语 |
WOS记录号 | WOS:000246015800030 |
出版者 | ELSEVIER SCIENCE BV |
URI标识 | http://www.irgrid.ac.cn/handle/1471x/2426981 |
专题 | 半导体研究所 |
通讯作者 | Ni, H. Q. |
作者单位 | Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China |
推荐引用方式 GB/T 7714 | Ni, H. Q.,Niu, Z. C.,Fang, Z. D.,et al. Optimization of gainnas(sb)/gaas quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy[J]. Journal of crystal growth,2007,301:125-128. |
APA | Ni, H. Q..,Niu, Z. C..,Fang, Z. D..,Huang, S. S..,Zhang, S. Y..,...&Wu, R. H..(2007).Optimization of gainnas(sb)/gaas quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy.Journal of crystal growth,301,125-128. |
MLA | Ni, H. Q.,et al."Optimization of gainnas(sb)/gaas quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy".Journal of crystal growth 301(2007):125-128. |
入库方式: iSwitch采集
来源:半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。