中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preferential orientation growth of ain thin films on si (111) substrates by lp-mocvd

文献类型:期刊论文

作者Zhao, Yongmei; Sun, Guosheng; Liu, Xingfang; Li, Jiaye; Zhao, Wanshun; Wang, Lei; Luo, Muchang; Li, Jinmin
刊名Modern physics letters b
出版日期2007-09-20
卷号21期号:22页码:1437-1445
关键词Aluminum nitride Low pressure metalorganic chemical vapor deposition (lp-mocvd) V/iii ratio Preferential orientation growth mechanism
ISSN号0217-9849
通讯作者Zhao, yongmei(ymzhao@semi.ac.cn)
英文摘要Aluminum nitride (ain) thin films were deposited on si (111) substrates by low pressure metalorganic chemical vapor deposition system. the effects of the v/iii ratios on the film structure and surface morphology were systematically studied. the chemical states and vibration modes of ain films were characterized by x-ray photoelectron spectroscopy and fourier transform infrared spectrometer. the optical absorption property of the ain films, characterized by ultraviolet-visible-near infrared spectrophotometer, exhibited a sharp absorption near the wavelength of 206 mm. the ain (002) preferential orientation growth was obtained at the v/iii ratio of 10,000 and the preferential growth mechanism is presented in this paper according to the thermodynamics and kinetics process of the ain growth.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; ALUMINUM NITRIDE FILMS ; ALN BUFFER LAYER ; LOW-TEMPERATURE ; SI
WOS研究方向Physics
WOS类目Physics, Applied ; Physics, Condensed Matter ; Physics, Mathematical
语种英语
WOS记录号WOS:000251972800001
出版者WORLD SCIENTIFIC PUBL CO PTE LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2426996
专题半导体研究所
通讯作者Zhao, Yongmei
作者单位Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhao, Yongmei,Sun, Guosheng,Liu, Xingfang,et al. Preferential orientation growth of ain thin films on si (111) substrates by lp-mocvd[J]. Modern physics letters b,2007,21(22):1437-1445.
APA Zhao, Yongmei.,Sun, Guosheng.,Liu, Xingfang.,Li, Jiaye.,Zhao, Wanshun.,...&Li, Jinmin.(2007).Preferential orientation growth of ain thin films on si (111) substrates by lp-mocvd.Modern physics letters b,21(22),1437-1445.
MLA Zhao, Yongmei,et al."Preferential orientation growth of ain thin films on si (111) substrates by lp-mocvd".Modern physics letters b 21.22(2007):1437-1445.

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来源:半导体研究所

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