中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The effects of lt aln buffer thickness on the optical properties of algan grown by mocvd and al composition inhomogeneity analysis

文献类型:期刊论文

作者Wang, X. L.; Zhao, D. G.; Jahn, U.; Ploog, K.; Jiang, D. S.; Yang, H.; Liang, J. W.
刊名Journal of physics d-applied physics
出版日期2007-02-21
卷号40期号:4页码:1113-1117
ISSN号0022-3727
DOI10.1088/0022-3727/40/4/031
通讯作者Wang, x. l.(wxl@mail.semi.ac.cn)
英文摘要We have investigated the growth of algan epilayers on a sapphire substrate by metalorganic chemical vapour deposition using various low-temperature ( lt) aln buffer thicknesses. combined scanning electron microscopy and cathodoluminescence investigations reveal the correlation between the surface morphology and optical properties of algan films in a microscopic scale. it is found that the suitable thickness of the lt aln buffer for high quality algan growth is around 20 nm. the al compositional inhomogeneity of the algan epilayer is attributed to the low lateral mobility of al adatoms on the growing surface.
WOS关键词PHOTODIODES
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000245274300032
出版者IOP PUBLISHING LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2427055
专题半导体研究所
通讯作者Wang, X. L.
作者单位1.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
2.Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
推荐引用方式
GB/T 7714
Wang, X. L.,Zhao, D. G.,Jahn, U.,et al. The effects of lt aln buffer thickness on the optical properties of algan grown by mocvd and al composition inhomogeneity analysis[J]. Journal of physics d-applied physics,2007,40(4):1113-1117.
APA Wang, X. L..,Zhao, D. G..,Jahn, U..,Ploog, K..,Jiang, D. S..,...&Liang, J. W..(2007).The effects of lt aln buffer thickness on the optical properties of algan grown by mocvd and al composition inhomogeneity analysis.Journal of physics d-applied physics,40(4),1113-1117.
MLA Wang, X. L.,et al."The effects of lt aln buffer thickness on the optical properties of algan grown by mocvd and al composition inhomogeneity analysis".Journal of physics d-applied physics 40.4(2007):1113-1117.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。