中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Generation and suppression of deep level defects in inp

文献类型:期刊论文

作者Zhao You-Wen; Dong Zhi-Yuan
刊名Acta physica sinica
出版日期2007-03-01
卷号56期号:3页码:1476-1479
关键词Indium phosphide Annealing Defect
ISSN号1000-3290
通讯作者Zhao you-wen(zhaoyw@red.semi.ac.cn)
英文摘要Deep level defects in as-grown and annealed n-type and semi-insulating inp have been studied. after annealing in phosphorus ambient, a large quantity of deep level defects were generated in both n-type and semi-insulating inp materials. in contrast, few deep level defects exist in inp after annealing in iron phosphide ambient. the generation of deep level defects has direct relation with in-diffusion of iron and phosphorus in the annealing process. the in-diffused phosphorus and iron atoms occupy indium sites in the lattice, resulting in the formation of p anti-site defects and iron deep acceptors, respectively. t e results indicate that iron atoms fully occupy indium sites and suppress the formation of indium vacancy and p anti-site, etc., whereas indium vacancies and p anti-site defects. are formed after annealing in phosphor-us ambient. the nature of the deep level defects in inp has been studied based on the results.
WOS关键词ENCAPSULATED CZOCHRALSKI INP ; CONTROLLED PHOSPHORUS VAPOR ; UNDOPED SEMIINSULATING INP ; FE-DOPED INP ; N-TYPE INP ; ELECTRICAL-PROPERTIES ; COMPENSATION DEFECTS ; HEAT-TREATMENT ; SPECTROSCOPY ; TEMPERATURE
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
WOS记录号WOS:000244849500040
出版者CHINESE PHYSICAL SOC
URI标识http://www.irgrid.ac.cn/handle/1471x/2427099
专题半导体研究所
通讯作者Zhao You-Wen
作者单位Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhao You-Wen,Dong Zhi-Yuan. Generation and suppression of deep level defects in inp[J]. Acta physica sinica,2007,56(3):1476-1479.
APA Zhao You-Wen,&Dong Zhi-Yuan.(2007).Generation and suppression of deep level defects in inp.Acta physica sinica,56(3),1476-1479.
MLA Zhao You-Wen,et al."Generation and suppression of deep level defects in inp".Acta physica sinica 56.3(2007):1476-1479.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。