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1.58 mu m ingaas quantum well laser on gaas

文献类型:期刊论文

作者Tangring, I.; Ni, H. Q.; Wu, B. P.; Wu, D. H.; Xiong, Y. H.; Huang, S. S.; Niu, Z. C.; Wang, S. M.; Lai, Z. H.; Larsson, A.
刊名Applied physics letters
出版日期2007-11-26
卷号91期号:22页码:3
ISSN号0003-6951
DOI10.1063/1.2803756
通讯作者Tangring, i.(ivar.tangring@mc2.chalmers.se)
英文摘要We demonstrate the 1.58 mu m emission at room temperature from a metamorphic in(0.6)ga(0.4)as quantum well laser grown on gaas by molecular beam epitaxy. the large lattice mismatch was accommodated through growth of a linearly graded buffer layer to create a high quality virtual in(0.32)ga(0.68)as substrate. careful growth optimization ensured good optical and structural qualities. for a 1250x50 mu m(2) broad area laser, a minimum threshold current density of 490 a/cm(2) was achieved under pulsed operation. this result indicates that metamorphic ingaas quantum wells can be an alternative approach for 1.55 mu m gaas-based lasers. (c) 2007 american institute of physics.
WOS关键词DOT LASERS ; GROWTH
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000251324600001
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2427117
专题半导体研究所
通讯作者Tangring, I.
作者单位1.Chalmers, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
2.Chinese Acad Sci, Inst Semicond, State Key Lab Superlattice & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Tangring, I.,Ni, H. Q.,Wu, B. P.,et al. 1.58 mu m ingaas quantum well laser on gaas[J]. Applied physics letters,2007,91(22):3.
APA Tangring, I..,Ni, H. Q..,Wu, B. P..,Wu, D. H..,Xiong, Y. H..,...&Larsson, A..(2007).1.58 mu m ingaas quantum well laser on gaas.Applied physics letters,91(22),3.
MLA Tangring, I.,et al."1.58 mu m ingaas quantum well laser on gaas".Applied physics letters 91.22(2007):3.

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来源:半导体研究所

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