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Comparison between gradient-doping gaas photocathode and uniform-doping gaas photocathode

文献类型:期刊论文

作者Yang, Zhi; Chang, Benkang; Zou, Jijun; Qiao, Jianliang; Gao, Pin; Zeng, Yiping; Li, Hui
刊名Applied optics
出版日期2007-10-01
卷号46期号:28页码:7035-7039
ISSN号1559-128X
通讯作者Chang, benkang(bkchang@mail.njust.edu.cn)
英文摘要We compared two reflection-mode negative electron affinity (nea) gaas photocathode samples that are grown by molecular beam epitaxy with p-type beryllium doping. one sample is uniform doping, and another is gradient doping. experimental curves of spectral response sensitivity and quantum efficiency are obtained. the thicknesses of the two cathodes are both 2.6 mu m. the integrated sensitivity of the uniform doping one is 1966 mu a/lm, and that of the gradient-doping one is 2421 mu a/lm. the escape probability and diffusion length are fitted from the spectral response curves. for the uniform-doping sample, the escape probability is 0.45 and the diffusion length is 5 mu m. for the gradient-doping sample, the escape probability is 0.55 and the diffusion length is 5.5 mu m. (c) 2007 optical society of america.
WOS关键词ACTIVATED GAAS ; PHOTOEMISSION
WOS研究方向Optics
WOS类目Optics
语种英语
WOS记录号WOS:000250566200025
出版者OPTICAL SOC AMER
URI标识http://www.irgrid.ac.cn/handle/1471x/2427167
专题半导体研究所
通讯作者Chang, Benkang
作者单位1.Nanjing Inst Sci & Technol, Inst Elect Engn & Optpelect Technol, Nanjing 210094, Jiangsu, Peoples R China
2.E China Inst Technol, Dept Elect Engn, Fuzhou 344000, Jiangxi, Peoples R China
3.Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
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GB/T 7714
Yang, Zhi,Chang, Benkang,Zou, Jijun,et al. Comparison between gradient-doping gaas photocathode and uniform-doping gaas photocathode[J]. Applied optics,2007,46(28):7035-7039.
APA Yang, Zhi.,Chang, Benkang.,Zou, Jijun.,Qiao, Jianliang.,Gao, Pin.,...&Li, Hui.(2007).Comparison between gradient-doping gaas photocathode and uniform-doping gaas photocathode.Applied optics,46(28),7035-7039.
MLA Yang, Zhi,et al."Comparison between gradient-doping gaas photocathode and uniform-doping gaas photocathode".Applied optics 46.28(2007):7035-7039.

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来源:半导体研究所

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