Effects of disk rotation rate on the growth of zno films by low-pressure metal-organic chemical vapor deposition
文献类型：期刊论文
| 作者 | Zhang, Panfeng; Wei, Hongyuan; Cong, Guangwei; Hu, Weiguo; Fan, Haibo; Wu, JieJun; Zhu, Qinsheng; Liu, Xianglin |
| 刊名 | Thin solid films
 |
| 出版日期 | 2008-01-30 |
| 卷号 | 516期号:6页码:925-928 |
| 关键词 | X-ray diffraction Metal-organic chemical vapor deposition Zinc oxide Structural properties |
| ISSN号 | 0040-6090 |
| DOI | 10.1016/j.tsf.2007.05.001 |
| 通讯作者 | Zhang, panfeng(zhangpanf@semi.ac.cn) |
| 英文摘要 | Zno films were grown at low pressure in a vertical metal-organic vapor deposition (mocvd) reactor with a rotating disk. the structural and morphological properties of the zno films grown at different disk rotation rate (drr) were investigated. the growth rate increases with the increase of drr. the zno film grown at the drr of 450 revolutions per minute (rpm) has the lowest x-ray rocking curve full width at half maximum and shows the best crystalline quality and morphology. in addition, the crystalline quality and morphology are improved as the drr increased but both are degraded when the drr is higher than 450 rpm. these results can help improve in understanding the rotation effects on the zno films grown by mocvd. (c) 2007 elsevier b.v. all rights reserved. |
| WOS关键词 | THIN-FILMS ; EPITAXIAL-GROWTH ; TEMPERATURE ; SAPPHIRE |
| WOS研究方向 | Materials Science ; Physics |
| WOS类目 | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 语种 | 英语 |
| WOS记录号 | WOS:000252980400009 |
| 出版者 | ELSEVIER SCIENCE SA |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2427286 |
| 专题 | 半导体研究所 |
| 通讯作者 | Zhang, Panfeng |
| 作者单位 | Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Panfeng,Wei, Hongyuan,Cong, Guangwei,et al. Effects of disk rotation rate on the growth of zno films by low-pressure metal-organic chemical vapor deposition[J]. Thin solid films,2008,516(6):925-928. |
| APA | Zhang, Panfeng.,Wei, Hongyuan.,Cong, Guangwei.,Hu, Weiguo.,Fan, Haibo.,...&Liu, Xianglin.(2008).Effects of disk rotation rate on the growth of zno films by low-pressure metal-organic chemical vapor deposition.Thin solid films,516(6),925-928. |
| MLA | Zhang, Panfeng,et al."Effects of disk rotation rate on the growth of zno films by low-pressure metal-organic chemical vapor deposition".Thin solid films 516.6(2008):925-928. |
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来源：半导体研究所
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