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Strain relaxation and band-gap tunability in ternary inxga1-xn nanowires

文献类型:期刊论文

作者Xiang, H. J.1; Wei, Su-Huai1; Da Silva, Juarez L. F.1; Li, Jingbo2
刊名Physical review b
出版日期2008-11-01
卷号78期号:19页码:4
关键词Density functional theory Energy gap Enthalpy Gallium compounds Ground states Iii-v semiconductors Indium compounds Monte carlo methods Nanowires Semiconductor quantum wires Wide band gap semiconductors
ISSN号1098-0121
DOI10.1103/physrevb.78.193301
通讯作者Xiang, h. j.()
英文摘要The alloy formation enthalpy and band structure of ingan nanowires were studied by a combined approach of the valence-force field model, monte carlo simulation, and density-functional theory (dft). for both random and ground-state structures of the coherent ingan alloy, the nanowire configuration was found to be more favorable for the strain relaxation than the bulk alloy. we proposed an analytical formula for computing the band gap of any ingan nanowires based on the results from the screened exchange hybrid dft calculations, which in turn reveals a better band-gap tunability in ternary ingan nanowires than the bulk alloy.
WOS关键词SPECIAL QUASIRANDOM STRUCTURES ; TOTAL-ENERGY CALCULATIONS ; AUGMENTED-WAVE METHOD ; BASIS-SET ; ALLOYS ; SEMICONDUCTORS ; INN
WOS研究方向Physics
WOS类目Physics, Condensed Matter
语种英语
WOS记录号WOS:000262607800007
出版者AMER PHYSICAL SOC
URI标识http://www.irgrid.ac.cn/handle/1471x/2427294
专题半导体研究所
通讯作者Xiang, H. J.
作者单位1.Natl Renewable Energy Lab, Golden, CO 80401 USA
2.Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Xiang, H. J.,Wei, Su-Huai,Da Silva, Juarez L. F.,et al. Strain relaxation and band-gap tunability in ternary inxga1-xn nanowires[J]. Physical review b,2008,78(19):4.
APA Xiang, H. J.,Wei, Su-Huai,Da Silva, Juarez L. F.,&Li, Jingbo.(2008).Strain relaxation and band-gap tunability in ternary inxga1-xn nanowires.Physical review b,78(19),4.
MLA Xiang, H. J.,et al."Strain relaxation and band-gap tunability in ternary inxga1-xn nanowires".Physical review b 78.19(2008):4.

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来源:半导体研究所

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