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Microstructure and optical properties of nonpolar m-plane gan films grown on m-plane sapphire by hydride vapor phase epitaxy

文献类型:期刊论文

作者Wei, Tongbo; Duan, Ruifei; Wang, Junxi; Li, Jinmin; Huo, Ziqiang; Yang, Jiankun; Zeng, Yiping
刊名Japanese journal of applied physics
出版日期2008-05-01
卷号47期号:5页码:3346-3349
关键词Hvpe Gan Sapphire Nonpolar Semipolar
ISSN号0021-4922
DOI10.1143/jjap.47.3346
通讯作者Wei, tongbo(tbwei@semi.ac.cn)
英文摘要Thick nonpolar (10 (1) over bar0) gan layers were grown on m-plane sapphire substrates by hydride vapor phase epitaxy (hvpe) using magnetron sputtered zno buffers, while semipolar (10 (1) over bar(3) over bar) gan layers were obtained by the conventional two-step growth method using the same substrate. the in-plane anisotropic structural characteristics and stress distribution of the epilayers were revealed by high. resolution x-ray diffraction and polarized raman scattering measurements. atomic force microscopy (afm) images revealed that the striated surface morphologies correlated with the basal plane stacking faults for both (10 (1) over bar0) and (10 (1) over bar(3) over bar) gan films. the m-plane gan surface showed many triangular-shaped pits aligning uniformly with the tips pointing to the c-axis after etching in boiled koh, whereas the oblique hillocks appeared on the semipolar epilayers. in addition, the dominant emission at 3.42ev in m-plane gan films displayed a red shift with respect to that in semipolar epilayers, maybe owing to the different strain states present in the two epitaxial layers. [doi: 10.1143/jjap.47.3346]
WOS关键词GALLIUM NITRIDE FILMS ; PHOTOLUMINESCENCE ; POWER ; PEAK
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000256462500006
出版者JAPAN SOCIETY APPLIED PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2427310
专题半导体研究所
通讯作者Wei, Tongbo
作者单位Chinese Acad Sci, Inst Semicond, Res & Dev Ctr Semicond Lighting Technol, Beijing 100083, Peoples R China
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GB/T 7714
Wei, Tongbo,Duan, Ruifei,Wang, Junxi,et al. Microstructure and optical properties of nonpolar m-plane gan films grown on m-plane sapphire by hydride vapor phase epitaxy[J]. Japanese journal of applied physics,2008,47(5):3346-3349.
APA Wei, Tongbo.,Duan, Ruifei.,Wang, Junxi.,Li, Jinmin.,Huo, Ziqiang.,...&Zeng, Yiping.(2008).Microstructure and optical properties of nonpolar m-plane gan films grown on m-plane sapphire by hydride vapor phase epitaxy.Japanese journal of applied physics,47(5),3346-3349.
MLA Wei, Tongbo,et al."Microstructure and optical properties of nonpolar m-plane gan films grown on m-plane sapphire by hydride vapor phase epitaxy".Japanese journal of applied physics 47.5(2008):3346-3349.

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来源:半导体研究所

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