中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fabrication and transport properties of zno/nb-1 wt %-doped srtio(3) epitaxial heterojunctions

文献类型:期刊论文

作者Wu, Yunlong1; Zhang, Liuwan1; Xie, Guanlin1; Zhu, Jia-Lin1; Chen, Yonghai2
刊名Applied physics letters
出版日期2008-01-07
卷号92期号:1页码:3
ISSN号0003-6951
DOI10.1063/1.2831913
通讯作者Zhang, liuwan(lwzhang@tsinghua.edu.cn)
英文摘要(110) zno/(001) nb-1 wt %-doped srtio(3) n-n type heteroepitaxial junctions were fabricated using the pulse laser deposition method. a diodelike current behavior was observed. different from conventional p-n junctions or schottky diodes, the diffusion voltage was found to increase with temperature. at all temperatures, the forward current was perfectly fitted on the thermionic emission model. the band bending at the interface can qualitatively explain our results, and the extracted high ideality factor at low temperatures, as well as large saturation currents, is ascribed to the deep-level-assisted tunneling current through the junction. (c) 2008 american institute of physics.
WOS关键词MANGANITE-BASED HETEROJUNCTION ; SCHOTTKY CONTACTS ; TUNNELING CURRENT ; ZNO
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000252284200083
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2427314
专题半导体研究所
通讯作者Zhang, Liuwan
作者单位1.Tsing Hua Univ, Dept Phys, Adv Mat Lab, Beijing 100084, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Wu, Yunlong,Zhang, Liuwan,Xie, Guanlin,et al. Fabrication and transport properties of zno/nb-1 wt %-doped srtio(3) epitaxial heterojunctions[J]. Applied physics letters,2008,92(1):3.
APA Wu, Yunlong,Zhang, Liuwan,Xie, Guanlin,Zhu, Jia-Lin,&Chen, Yonghai.(2008).Fabrication and transport properties of zno/nb-1 wt %-doped srtio(3) epitaxial heterojunctions.Applied physics letters,92(1),3.
MLA Wu, Yunlong,et al."Fabrication and transport properties of zno/nb-1 wt %-doped srtio(3) epitaxial heterojunctions".Applied physics letters 92.1(2008):3.

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来源:半导体研究所

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