中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The effect of low temperature aln interlayers on the growth of gan epilayer on si (111) by mocvd

文献类型:期刊论文

作者Luo, Weijun; Wang, Xiaoliang; Guo, Lunchun; Xiao, Hongling; Wang, Cuimei; Ran, Junxue; Li, Jianping; Li, Jinmin
刊名Superlattices and microstructures
出版日期2008-08-01
卷号44期号:2页码:153-159
关键词Gallium nitride crack Low temperature aluminum nitride Interlayer Silicon
ISSN号0749-6036
DOI10.1016/j.spmi.2008.04.003
通讯作者Luo, weijun(luoweijun@mail.semi.ac.cn)
英文摘要Low temperature (lt) aln interlayers were used to effectively reduce the tension stress and micro-cracks on the surface of the gan epilayer grown on si (111) substrate. optical microscopy (om), atomic force microscopy (afm), surface electron microscopy (sem) and x-ray diffraction (xrd) were employed to characterize these samples grown by metal-organic chemical vapor deposition (mocvd). in addition, wet etching method was used to evaluate the defect of the gan epilayer. the results demonstrate that the morphology and crystalline properties of the gan epilayer strongly depend on the thickness, interlayer number and growth temperature of the lt aln interlayer. with the optimized lt aln interlayer structures, high quality gan epilayers with a low crack density can be obtained. (c) 2008 elsevier ltd. all rights reserved.
WOS关键词CRACK-FREE GAN ; BUFFER LAYERS ; SI SUBSTRATE ; MOVPE GROWTH ; THICKNESS ; EPITAXY ; STRESS ; STRAIN
WOS研究方向Physics
WOS类目Physics, Condensed Matter
语种英语
WOS记录号WOS:000258811700003
出版者ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2427323
专题半导体研究所
通讯作者Luo, Weijun
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Luo, Weijun,Wang, Xiaoliang,Guo, Lunchun,et al. The effect of low temperature aln interlayers on the growth of gan epilayer on si (111) by mocvd[J]. Superlattices and microstructures,2008,44(2):153-159.
APA Luo, Weijun.,Wang, Xiaoliang.,Guo, Lunchun.,Xiao, Hongling.,Wang, Cuimei.,...&Li, Jinmin.(2008).The effect of low temperature aln interlayers on the growth of gan epilayer on si (111) by mocvd.Superlattices and microstructures,44(2),153-159.
MLA Luo, Weijun,et al."The effect of low temperature aln interlayers on the growth of gan epilayer on si (111) by mocvd".Superlattices and microstructures 44.2(2008):153-159.

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来源:半导体研究所

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