中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Valence band offset of inn/4h-sic heterojunction measured by x-ray photoelectron spectroscopy

文献类型:期刊论文

作者Zhang, B. L.1; Sun, G. S.2; Guo, Y.1; Zhang, P. F.1; Zhang, R. Q.1; Fan, H. B.1; Liu, X. L.1; Yang, S. Y.1; Zhu, Q. S.1; Wang, Z. G.1
刊名Applied physics letters
出版日期2008-12-15
卷号93期号:24页码:3
ISSN号0003-6951
关键词Conduction bands Iii-v semiconductors Indium compounds Interface states Semiconductor heterojunctions Silicon compounds Valence bands Wide band gap semiconductors X-ray photoelectron spectra
DOI10.1063/1.3046116
通讯作者Zhang, b. l.(zhangbaoli@semi.ac.cn)
英文摘要The valence band offset (vbo) of inn/4h-sic heterojunction has been directly measured by x-ray photoelectron spectroscopy. the vbo is determined to be 0.55 +/- 0.23 ev and the conduction band offset is deduced to be -2.01 +/- 0.23 ev, indicating that the heterojunction has a type-i band alignment. the accurate determination of the valence and conduction band offsets is important for applications of inn/sic optoelectronic devices.
WOS关键词MOVPE INN ; 3C-SIC/SI(111) ; SEMICONDUCTOR ; EPITAXY ; ALN ; GAN
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000261896400036
URI标识http://www.irgrid.ac.cn/handle/1471x/2427382
专题半导体研究所
通讯作者Zhang, B. L.
作者单位1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Novel Semicond Mat Lab, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhang, B. L.,Sun, G. S.,Guo, Y.,et al. Valence band offset of inn/4h-sic heterojunction measured by x-ray photoelectron spectroscopy[J]. Applied physics letters,2008,93(24):3.
APA Zhang, B. L..,Sun, G. S..,Guo, Y..,Zhang, P. F..,Zhang, R. Q..,...&Wang, Z. G..(2008).Valence band offset of inn/4h-sic heterojunction measured by x-ray photoelectron spectroscopy.Applied physics letters,93(24),3.
MLA Zhang, B. L.,et al."Valence band offset of inn/4h-sic heterojunction measured by x-ray photoelectron spectroscopy".Applied physics letters 93.24(2008):3.

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来源:半导体研究所

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