中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The influence of schottky contact metals on the strain of algan barrier layers

文献类型:期刊论文

作者Lin, Zhaojun1; Zhao, Jianzhi1; Corrigan, Timothy D.1; Wang, Zhen1; You, Zhidong1; Wang, Zhanguo2; Lu, Wu3
刊名Journal of applied physics
出版日期2008-02-15
卷号103期号:4页码:4
ISSN号0021-8979
DOI10.1063/1.2841328
通讯作者Lin, zhaojun(linzj@sdu.edu.cn)
英文摘要Ir and ni schottky contacts on strained al(0.25)ga(0.75)n/gan heterostructures, and the ni schottky contact with different areas on strained al(0.3)ga(0.7)n/gan heterostructures have been prepared. using the measured capacitance-voltage curves and the current-voltage curves obtained from the prepared schottky contacts, the polarization charge densities of the algan barrier layer for the schottky contacts were analyzed and calculated by self-consistently solving schrodinger's and poisson's equations. it is found that the polarization charge density of the algan barrier layer for the ir schottky contact on strained al(0.25)ga(0.75)n/gan heterostructures is different from that of the ni schottky contact, and the polarization charge densities of the algan barrier layer for ni schottky contacts with different areas on strained al(0.3)ga(0.7)n/gan heterostructures are different corresponding to different ni schottky contact areas. as a result, the conclusion can be made that schottky contact metals on strained algan/gan heterostructures have an influence on the strain of the algan barrier layer. (c) 2008 american institute of physics.
WOS关键词PIEZOELECTRIC POLARIZATION ; HETEROSTRUCTURES
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000254191300069
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2427485
专题半导体研究所
通讯作者Lin, Zhaojun
作者单位1.Shandong Univ, Sch Phys & Microelect, Jinan 250100, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
3.Ohio State Univ, Dept Elect Engn, Columbus, OH 43210 USA
推荐引用方式
GB/T 7714
Lin, Zhaojun,Zhao, Jianzhi,Corrigan, Timothy D.,et al. The influence of schottky contact metals on the strain of algan barrier layers[J]. Journal of applied physics,2008,103(4):4.
APA Lin, Zhaojun.,Zhao, Jianzhi.,Corrigan, Timothy D..,Wang, Zhen.,You, Zhidong.,...&Lu, Wu.(2008).The influence of schottky contact metals on the strain of algan barrier layers.Journal of applied physics,103(4),4.
MLA Lin, Zhaojun,et al."The influence of schottky contact metals on the strain of algan barrier layers".Journal of applied physics 103.4(2008):4.

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来源:半导体研究所

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