中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Origin and enhancement of hole-induced ferromagnetism in first-row d(0) semiconductors

文献类型:期刊论文

作者Peng, Haowei1; Xiang, H. J.2; Wei, Su-Huai2; Li, Shu-Shen1; Xia, Jian-Bai1; Li, Jingbo1
刊名Physical review letters
出版日期2009-01-09
卷号102期号:1页码:4
ISSN号0031-9007
DOI10.1103/physrevlett.102.017201
通讯作者Peng, haowei()
英文摘要The origin of ferromagnetism in d(0) semiconductors is studied using first-principles methods with zno as a prototype material. we show that the presence of spontaneous magnetization in nitrides and oxides with sufficient holes is an intrinsic property of these first-row d(0) semiconductors and can be attributed to the localized nature of the 2p states of o and n. we find that acceptor doping, especially doping at the anion site, can enhance the ferromagnetism with much smaller threshold hole concentrations. the quantum confinement effect also reduces the critical hole concentration to induce ferromagnetism in zno nanowires. the characteristic nonmonotonic spin couplings in these systems are explained in terms of the band coupling model.
WOS关键词COLLECTIVE ELECTRON FERROMAGNETISM ; ENERGY ; MODEL
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
WOS记录号WOS:000262355000064
出版者AMER PHYSICAL SOC
URI标识http://www.irgrid.ac.cn/handle/1471x/2427566
专题半导体研究所
通讯作者Peng, Haowei
作者单位1.Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
2.Natl Renewable Energy Lab, Golden, CO 80401 USA
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GB/T 7714
Peng, Haowei,Xiang, H. J.,Wei, Su-Huai,et al. Origin and enhancement of hole-induced ferromagnetism in first-row d(0) semiconductors[J]. Physical review letters,2009,102(1):4.
APA Peng, Haowei,Xiang, H. J.,Wei, Su-Huai,Li, Shu-Shen,Xia, Jian-Bai,&Li, Jingbo.(2009).Origin and enhancement of hole-induced ferromagnetism in first-row d(0) semiconductors.Physical review letters,102(1),4.
MLA Peng, Haowei,et al."Origin and enhancement of hole-induced ferromagnetism in first-row d(0) semiconductors".Physical review letters 102.1(2009):4.

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来源:半导体研究所

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