Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering
文献类型：期刊论文
| 作者 | You, J. B.; Zhang, X. W.; Fan, Y. M.; Yin, Z. G.; Cai, F.; Chen, N. F. |
| 刊名 | Applied surface science
 |
| 出版日期 | 2009-03-15 |
| 卷号 | 255期号:11页码:5876-5880 |
| 关键词 | Crystal quality Rf magnetron sputtering Zinc oxide Semiconducting ii-vi materials |
| ISSN号 | 0169-4332 |
| DOI | 10.1016/j.apsusc.2009.01.024 |
| 通讯作者 | Zhang, x. w.(xwzhang@semi.ac.cn) |
| 英文摘要 | The zno films were deposited on c-plane sapphire, si (0 0 1) and mgal2o4 (1 1 1) substrates in pure ar ambient at different substrate temperatures ranging from 400 to 750 degrees c by radio frequency magnetron sputtering. x-ray diffraction, photoluminescence and hall measurements were used to evaluate the growth temperature and the substrate effects on the properties of zno films. the results show that the crystalline quality of the zno films improves with increasing the temperature up to 600 degrees c, the crystallinity of the films is degraded as the growth temperature increasing further, and the zno film with the best crystalline quality is obtained on sapphire at 600 degrees c. the intensity of the photoluminescence and the electrical properties strongly depend on the crystalline quality of the zno films. the zno films with the better crystallinity have the stronger ultraviolet emission, the higher mobility and the lower residual carrier concentration. the effects of crystallinity on light emission and electrical properties, and the possible origin of the n-type conductivity of the undoped zno films are also discussed. (c) 2009 elsevier b. v. all rights reserved. |
| WOS关键词 | MOLECULAR-BEAM EPITAXY ; PULSED-LASER DEPOSITION ; C-PLANE SAPPHIRE ; OXIDE THIN-FILMS ; ZINC-OXIDE ; GRAIN-SIZE ; GROWTH ; PHOTOLUMINESCENCE ; HYDROGEN ; AMBIENT |
| WOS研究方向 | Chemistry ; Materials Science ; Physics |
| WOS类目 | Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 语种 | 英语 |
| WOS记录号 | WOS:000263893800040 |
| 出版者 | ELSEVIER SCIENCE BV |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2427636 |
| 专题 | 半导体研究所 |
| 通讯作者 | Zhang, X. W. |
| 作者单位 | Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | You, J. B.,Zhang, X. W.,Fan, Y. M.,et al. Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering[J]. Applied surface science,2009,255(11):5876-5880. |
| APA | You, J. B.,Zhang, X. W.,Fan, Y. M.,Yin, Z. G.,Cai, F.,&Chen, N. F..(2009).Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering.Applied surface science,255(11),5876-5880. |
| MLA | You, J. B.,et al."Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering".Applied surface science 255.11(2009):5876-5880. |
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来源：半导体研究所
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