Fabrication and infrared optical properties of nano vanadium dioxide thin films
文献类型：期刊论文
| 作者 | Liang Ji-Ran1; Hu Ming1; Wang Xiao-Dong2; Li Gui-Ke3; Ji An2; Yang Fu-Hua2; Liu Jian3; Wu Nan-Jian3; Chen Hong-Da4 |
| 刊名 | Acta physico-chimica sinica
 |
| 出版日期 | 2009-08-01 |
| 卷号 | 25期号:8页码:1523-1529 |
| 关键词 | Dual ion beam sputtering Nano-vanadium dioxide thin film Transmission |
| ISSN号 | 1000-6818 |
| DOI | 10.3866/pku.whxb20090749 |
| 通讯作者 | Liang ji-ran(liang_jiran@tju.edu.cn) |
| 英文摘要 | Vanadium dioxide thin films were fabricated by ion beam sputtering on si3n4/sio2/si after a post reductive annealing process in a nitrogen atmosphere. x-ray diffraction (xrd), scanning electron microscope (sem), and x-ray photoelectron spectroscopy (xps) were employed to analyze the effects of post annealing temperature on crystallinity, morphology, and composition of the vanadium oxide thin films. transmission properties of vanadium dioxide thin films were measured by fourier transform-infrared (ft-ir) spectroscopy. the results showed that the as-deposited vanadium oxide thin films were composed of non-crystalline v2o5 and a tetragonal rutile vo2. after annealing at 400 degrees c for 2 h, the mixed phase vanadium oxide (vox) thin film changed its composition and structure to vo2 and had a (011) oriented monoclinic rutile structure. when increasing the temperature to 450 degrees c, nano vo2 thin films with smaller grains were obtained. ft-ir results showed that the transmission contrast factor of the nano vo2 thin film was more than 0.99 and the transmission of smaller grain nano vo2 thin film was near zero at its switched state. nano vo2 thin film with smaller grains is an ideal material for application in optical switching devices. |
| WOS关键词 | VO2 FILMS ; TEMPERATURE ; TRANSITION |
| WOS研究方向 | Chemistry |
| WOS类目 | Chemistry, Physical |
| 语种 | 英语 |
| WOS记录号 | WOS:000268651600008 |
| 出版者 | PEKING UNIV PRESS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2427648 |
| 专题 | 半导体研究所 |
| 通讯作者 | Liang Ji-Ran |
| 作者单位 | 1.Tianjin Univ, Sch Elect & Informat Engn, Tianjin 300072, Peoples R China 2.Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China 3.Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China 4.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liang Ji-Ran,Hu Ming,Wang Xiao-Dong,et al. Fabrication and infrared optical properties of nano vanadium dioxide thin films[J]. Acta physico-chimica sinica,2009,25(8):1523-1529. |
| APA | Liang Ji-Ran.,Hu Ming.,Wang Xiao-Dong.,Li Gui-Ke.,Ji An.,...&Chen Hong-Da.(2009).Fabrication and infrared optical properties of nano vanadium dioxide thin films.Acta physico-chimica sinica,25(8),1523-1529. |
| MLA | Liang Ji-Ran,et al."Fabrication and infrared optical properties of nano vanadium dioxide thin films".Acta physico-chimica sinica 25.8(2009):1523-1529. |
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来源：半导体研究所
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